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Mechanical arm clamping hand cleaning tank capable of achieving rapid discharging

A technology of a robotic arm and a cleaning tank, which is applied in the field of semiconductor manufacturing equipment, can solve the problems of hand-pinch pollution and cross-contamination of the robotic arm, and achieve the effects of facilitating the jet pipe and the liquid jet pipe, improving the applicability, and facilitating the disassembly and adjustment.

Active Publication Date: 2021-05-11
PNC PROCESS SYSTEMS CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Usually, the robotic arm gripper cleaning tank uses pure water to spray and clean the swinging robotic arm gripper through the spray device arranged in an array, but the cleaning tank usually adopts a flat bottom cavity design, and there are often reasons during the cleaning process. Residues such as cleaning fluid and fine dust adhere to the wall of the chamber for cleaning, which is not easy to cause cross-contamination during the cleaning process, and then causes contamination of other process sections by the gripper of the robotic arm

Method used

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  • Mechanical arm clamping hand cleaning tank capable of achieving rapid discharging
  • Mechanical arm clamping hand cleaning tank capable of achieving rapid discharging
  • Mechanical arm clamping hand cleaning tank capable of achieving rapid discharging

Examples

Experimental program
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Embodiment Construction

[0020] Such as Figure 1 to Figure 3 As shown, the fast-discharging cleaning tank of the robotic arm gripper of the present invention includes an outer tank body 100 , an inner tank body 200 and two spray pipe assemblies 300 .

[0021] Both the outer tank body 100 and the inner tank body 200 are rectangular tank bodies. The inner tank body 200 is fixed in the outer tank body 100 , the top surface of the inner tank body 200 is slightly lower than the top surface of the outer tank body, and the bottom surface of the inner tank body 200 extends to the middle of the outer tank body 200 .

[0022] Wherein, the top of the outer tank body 100 is open, and the bottom has an inclined bottom surface inclined downward from the front end and the rear end respectively, the inclined bottom surface on the front end side has an inclined angle of 176°, and the inclined bottom surface on the rear end side has an inclined angle of 178°. A discharge port 101 is provided at the lowest position of...

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PUM

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Abstract

The invention discloses a mechanical arm clamping hand cleaning tank capable of achieving rapid discharging. The mechanical arm clamping hand cleaning tank comprises an outer tank body, an inner tank body fixed in the outer tank body and a spraying pipe assembly fixed in the inner tank body, the top of the outer tank body is open, the bottom of the outer tank body is an inclined bottom face, a discharging opening is formed in the lowest position of the outer tank body, and the top and the bottom of the inner tank body are both open. According to the mechanical arm clamping hand cleaning tank capable of achieving rapid discharging, residues generated during cleaning can be rapidly discharged out of the cleaning tank, the cleaning efficiency is improved, and cross contamination of a mechanical arm clamping hand can be effectively prevented.

Description

technical field [0001] The invention belongs to the technical field of semiconductor manufacturing equipment, and relates to a cleaning tank for cleaning the gripper of a mechanical arm, in particular to a cleaning tank capable of rapidly discharging residues. Background technique [0002] In the semiconductor manufacturing process, a large amount of wet process equipment is required. The relevant wet process equipment uses robotic arms to pick up batches of wafers or wafer baskets and other objects for wet process. Taking wet cleaning equipment as an example, the gripper of the robotic arm needs to clean the gripper of the robotic arm before transporting batches of wafers or wafer baskets to various wafer cleaning tanks. Usually, the robotic arm gripper cleaning tank uses pure water to spray and clean the swinging robotic arm gripper through the spray device arranged in an array, but the cleaning tank usually adopts a flat bottom cavity design, and there are often reasons d...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B08B3/02B08B13/00F26B21/00
CPCB08B3/02B08B13/00F26B21/004
Inventor 李志峰徐铭陈佳炜王雪松
Owner PNC PROCESS SYSTEMS CO LTD
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