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Surface cleaning device

A technology of surface cleaning device and main body, applied in cleaning methods and utensils, chemical instruments and methods, etc., can solve problems such as product surface residues

Pending Publication Date: 2021-05-18
东莞市峰谷纳米科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] In view of this, the present invention aims to propose a surface cleaning device to solve the problem that the existing surface cleaning devices mostly use metal electrodes, and after the metal electrodes are sputtered, the generated metal and metal compounds cause residues on the product surface

Method used

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Examples

Experimental program
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Effect test

Embodiment 1

[0027] See attached figure 1 , a surface cleaning device, the inside of the main body 2 is hollow to form a cavity 3, the inside of the cavity 3 is provided with a fixed frame 8 and a graphite electrode 9, the fixed frame 8 covers the graphite electrode 9, the The fixing frame 8 is electrically connected to the high voltage power supply 12, and the main body 2 is respectively communicated with the inert gas box 13, the active gas box 14, and the vacuum pump unit 1.

[0028] Specifically, the main body 2 has a rectangular shape as a whole, and a pressure-resistant plate is arranged inside the main body 2. The main body 2 is a hollow structure, and the fixing frame 8 covers the graphite electrode 9. Graphite electrode 9 is fixed, and described fixture 8 and described graphite electrode 9 are fixed on the bottom of described cavity 3, and described graphite electrode 9 is electrically connected with described high-voltage power supply 12, and described high-voltage power supply 1...

Embodiment 2

[0035] On the basis of embodiment one, the surface cleaning device of embodiment one is further optimized:

[0036] One side of the main body 2 is provided with an electric control box 11 , and the electric control box 11 is electrically connected with the solenoid valve 15 .

[0037] Specifically, the switch of the solenoid valve 15 is controlled by the electric control box 11 , that is, the gas entering the main body 2 is controlled by the electric control box 11 .

Embodiment 3

[0039] On the basis of embodiment one, the surface cleaning device of embodiment one is further optimized:

[0040] The main body 2 is provided with an observation window 201 .

[0041] Specifically, see the attached figure 2 , the observation window 201 can expose the jaws 4, and the parts to be cleaned can be clamped between the jaws 4, and the cleaning process of the product can be observed through the observation window 201.

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PUM

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Abstract

The invention discloses a surface cleaning device. The surface cleaning device comprises a main machine body, a vacuum pump set is arranged on one side of the main machine body, an inert gas box and an active gas box are further arranged at the bottom of the main machine body, a high-voltage power source is arranged on one side of the inert gas box, the inert gas box and the active gas box communicate with the main machine body through pipelines, and the interior of the main machine body is hollow to form a cavity. In the surface cleaning device, graphite is adopted as electrodes to ionize active gas and inert gas, after the graphite electrodes react with the active gas and the inert gas, residues cannot be generated on the surface of a cleaned product, and the ionization rate of the inert gas and the active gas is increased due to the fact that the multiple sets of graphite electrodes are arranged.

Description

technical field [0001] The invention relates to the technical field of product cleaning, in particular to a surface cleaning device. Background technique [0002] The products produced are required to be free from polluting impurity particles and any chemical residues on the surface. The existing surface cleaning devices mostly use metal electrodes. After the metal electrodes are sputtered, the generated metals and metal compounds will cause residues on the product surface. Contents of the invention [0003] In view of this, the present invention aims to propose a surface cleaning device to solve the problem that the existing surface cleaning devices mostly use metal electrodes, and after the metal electrodes are sputtered, the generated metal and metal compounds cause residues on the product surface. [0004] In order to achieve the above object, technical solution of the present invention is achieved in that way: [0005] A surface cleaning device, comprising a main bod...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B08B7/00B08B13/00
CPCB08B7/00B08B13/00
Inventor 高佳
Owner 东莞市峰谷纳米科技有限公司
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