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Photomask inclined drilling hole conversion adjusting support

A technology of tilting drilling and adjusting brackets, which is applied in the field of mask plates, and can solve problems such as wasting time, mask plate displacement, and drilling misalignment

Active Publication Date: 2021-05-18
江苏高光半导体材料有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] When drilling, it is easy to cause displacement of the mask, resulting in misalignment of the drilling, and damage to the mask during the clamping process. When processing, for drilling in different directions, the mask needs to be repositioned. Repositioning and re-clamping the drilled holes wastes a lot of time

Method used

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  • Photomask inclined drilling hole conversion adjusting support
  • Photomask inclined drilling hole conversion adjusting support
  • Photomask inclined drilling hole conversion adjusting support

Examples

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Embodiment Construction

[0031] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.

[0032] see Figure 1-7 , the present invention provides a technical solution: a mask plate inclined drilling conversion adjustment bracket, including an operation table 1, two sets of aligned supports 2 are installed on the operation table 1, and the supports 2 are connected by rotating shafts and can be turned over The flip plate 3 is provided with an isosceles right-angle plate 6 at the bottom of the flip plate 3, and multiple sets of isosceles righ...

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Abstract

The invention discloses a photomask inclined drilling hole conversion adjusting support in the technical field of photomasks. The photomask inclined drilling hole conversion adjusting support is characterized in that limiting components are mounted at the bottom of an overturning plate, the limiting components are mounted on two sides of the support, the overturning plate overturns towards two sides and is blocked by the limiting components and limited to a preset position, a clamping assembly is mounted on the overturning plate, a locking assembly is arranged at the bottom of the overturning plate, and the overturning plate is locked through the locking assembly after the overturning plate is overturned and adjusted. According to the support, the overturning plate can be overturned by certain angles on the two sides, drilling on the two sides is convenient, damage to a photomask caused by repeated moving and fixing is avoided, a fixed clamping plate and a movable clamping plate can rapidly complete protective clamping and fixing of the photomask, the influence of loosening in the drilling process on drilling is avoided, through the arranged limiting components, limiting can be conducted after the overturning plate is overturned, and it is ensured that a vertical drilling machine can drill 45-degree holes in the photomask.

Description

technical field [0001] The invention relates to the technical field of mask plates, in particular to a mask plate inclined drilling conversion adjustment bracket. Background technique [0002] The mask plate is the graphic master used in the photolithography process commonly used in micro-nano processing technology. A mask graphic structure is formed on a transparent substrate by an opaque light-shielding film, and then the graphic information is transferred to the product substrate through an exposure process. The metal mask is a hollowed out structure that does not require photolithography, and can be directly sputtered or evaporated on the substrate. The material will pass through the hollowed out part of the metal mask and be deposited on the surface of the substrate to directly obtain Graphical deposition graphics that can be used multiple times. [0003] When the mask is processed, it is necessary to drill a hole at an angle of 45° to the surface. The current five-ax...

Claims

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Application Information

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IPC IPC(8): B23Q1/44B23Q3/06B23Q16/00
CPCB23Q1/44B23Q3/062B23Q16/00
Inventor 钱超杨波洪明王有明
Owner 江苏高光半导体材料有限公司
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