Radial polarizer for particle detection
Patent Information
- Authority / Receiving Office
- CN · China
- Current Assignee / Owner
- KLA TENCOR CORP
- Publication Date
- 2021-06-15
Smart Images

Figure 1 
Figure 2 
Figure 3
Abstract
Description
[0001] Cross References to Related Applications
[0002] This application asserts under 35 U.S.C. §119(e) that Jenn-Kuen Leong, Daniel Kavaldjiev, John Fielden, and Guoheng Zhao) U.S. Provisional Application Serial No. 62 / 767,246 entitled "PARTICLE DETECTION WITH IMPROVED RESOLUTION ON WAFER INSPECTION SYSTEM" filed on November 14, 2018 interest in the case, which is incorporated herein by reference in its entirety. technical field
[0003] The present invention relates generally to particle inspection, and more particularly to dark field particle inspection. Background technique
[0004] Particle inspection systems are commonly used in semiconductor processing lines to identify defects or particles on wafers such as, but not limited to, unpatterned wafers. As semiconductor devices continue to shrink, particle detection systems require a corresponding increase in sensitivity and resolution. A significant source of noise that can limit measurement sensitivity is surface s...