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Systems and methods for particle detection

A technology for particle detection and lighting direction, applied in particle and sedimentation analysis, measuring device, particle size analysis, etc., which can solve problems such as inability to achieve sensitivity and image quality

Active Publication Date: 2022-06-17
KLA CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

While various approaches have been proposed to suppress surface scatter relative to scatter from particles, such approaches may not achieve desirable levels of sensitivity and / or may achieve sensitivity at the expense of degraded image quality

Method used

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  • Systems and methods for particle detection
  • Systems and methods for particle detection
  • Systems and methods for particle detection

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Embodiment Construction

[0025] Reference will now be made in detail to the disclosed subject matter illustrated in the accompanying drawings. The invention has been particularly shown and described with respect to specific embodiments and specific features thereof. The embodiments set forth herein are to be regarded as illustrative and not restrictive. As used herein, directional terms (eg, "left", "right", "top", "bottom", "above", "below", "upper", "upward", "downward", "downward" and "downward") are intended to provide relative positions for descriptive purposes and do not wish to specify an absolute frame of reference. It will be readily apparent to those of ordinary skill in the art that various changes and modifications in form and details may be made therein without departing from the spirit and scope of the present invention.

[0026] Embodiments of the invention relate to darkfield imaging based on exploiting haze in the pupil plane to repel polarizers to selectively filter surface scatter...

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Abstract

The present invention discloses a dark field inspection system, which may include: an illumination source for generating an illumination beam; one or more illumination optics for directing the illumination beam along an illumination direction at an off-axis angle to a sample; a detector; one or more collection optics for producing a dark field image of the sample on the detector based on light collected from the sample in response to the illumination beam; and radial polarization a polarizer positioned at a pupil plane of the one or more collection optics, wherein the radial polarizer repels specular reflections from the sample in the pupil plane corresponding to the illumination beam The reference point has radially polarized light.

Description

[0001] Cross-references to related applications [0002] This application claims under 35 U.S.C. §119(e) the names of Jenn-Kuen Leong, Daniel Kavaldjiev, John Fielden, and Guoheng Zhao US Provisional Application Serial No. 62 / 767,246, entitled "PARTICLE DETECTION WITH IMPROVED RESOLUTION ON WAFER INSPECTION SYSTEM," filed November 14, 2018 by the inventor of Zhao) the rights of the case, the entire contents of which are incorporated herein by reference. technical field [0003] The present invention relates generally to particle inspection, and more particularly, to dark field particle inspection. Background technique [0004] Particle inspection systems are commonly used in semiconductor processing lines to identify defects or particles on wafers such as, but not limited to, unpatterned wafers. As semiconductor devices continue to shrink, particle detection systems require corresponding increases in sensitivity and resolution. An obvious source of noise that can limit m...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01N21/94G01N21/47G01N15/02G01N21/84
CPCG01N21/8806G01N21/94G01N21/9501H01L22/12H01L22/10G01N2021/8822G01N2021/8848G01N21/47G01N15/0211G01N2021/473G01N2021/8461G01N21/21G01N21/95607
Inventor J-K·龙D·卡瓦德杰夫国衡·赵
Owner KLA CORP