Method of manufacturing ultrasonic sensors
A sensor and ultrasonic technology, applied in the manufacture/assembly of piezoelectric/electrostrictive devices, fluids using vibration, piezoelectric devices/electrostrictive devices, etc., can solve the problem of quality degradation of piezoelectric rods and the yield rate of ultrasonic sensors low level problem
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Embodiment 1
[0079]Micropatterns with a line width of 50 μm were formed on a silicon wafer by photolithography. PZT piezoelectric powder (average particle size = 0.5 μm to 3 μm) was filled into the concave portion of the micropattern by spraying, pressurized at 300 MPa, heated at 1 °C / min, kept at 850 °C for 2 hours, and heated at 1 °C / min cooling. Repeat the sintering and cooling steps under the same conditions. The substrate is removed by photolithography, filled with epoxy resin insulating material, metal gold is deposited, the wire electrodes are patterned by photolithography, and cut into ultrasonic sensors.
Embodiment 2
[0081] An ultrasonic sensor was fabricated in the same manner as in Example 1 except that pressurization was performed at 400 MPa.
experiment example 1
[0085] The ultrasonic sensors of Comparative Example 1 and Examples 1 to 2 were imaged using a scanning electron microscope (SEM). The image is shown in Figures 8 to 11 middle. refer to Figure 9 , in the ultrasonic sensor of Comparative Example 1, a large number of pores were formed between particles having smaller particle diameters. On the contrary, in embodiment 1 to 2 (see Figure 10 and 11 ) of the ultrasonic sensor, a smaller number of pores are formed between particles with larger particle diameters.
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