A pulsed ion source coating extraction device

Abstract

The invention relates to a pulsed ion source coating extraction device, comprising a pulsed electrode, a cathode target and an anode; the anode comprises an outer cylinder and an inner anode ring; the cathode target and the outer cylinder are connected; the anode ring is connected to the outer cylinder; An insulating material is arranged between the outer cylinders; the cathode target is cylindrical, inserted into the outer cylinder, and located above the anode ring in the outer cylinder; the center line of the cathode target passes through the central hole of the anode ring; the cathode target is connected to the drive The motor is driven and connected to drive the cathode target to feed to the anode ring; a pulse electrode is sleeved on the outer side of the ion emission end of the cathode target, and the exposed end of the cathode target extends out of the pulse electrode, and a pulse electrode is arranged between the cathode target and the pulse electrode. Insulating sleeve; the anode ring is connected to the positive pole of the power supply, the cathode target is connected to the negative pole or ground of the power supply, and the pulse electrode is connected to the pulse power supply. The ion beam extracted by the ion source of the invention can be continuous, the quality of the extracted ion beam is improved, and the distribution is uniform.

Description

technical field [0001] The invention relates to the technical field of ion beam coating, in particular to a pulsed ion source coating extraction device. Background technique [0002] The pulsed ion source has been widely used in ion beam coating technology. The current pulsed ion source generally adopts a round rod cathode target with a smaller diameter in the preparation of thin films, and a round rod cathode with a larger diameter in the preparation of thick films. target. In this method, during the coating process, with the consumption of the target, the surface of the cathode target and the surrounding structure will change, and the ion source beam will also change, which will cause the ion source beam to be unstable. At the same time, with the intensification of consumption, the cathode target shrinks back, and the conditions for the ion source to be drawn out by the pulse power supply have changed greatly. After a certain level, the ion source cannot be drawn out. Th...

AI Technical Summary

Problems solved by technology

However, the beam spot induced by this structure is quite scattered, and the distribution of the beam spot beam is not uniform

[0003] In addition, the existing extraction anodes generally use a cylinder as the anode. In this way, the extracted beam spot can be made as large as possible. However, because the beam spot extracted by this structure is not focused, and the beam itself is charged, there is no interaction with each other. Repel each other, so the beam spot is quite scattered, and the beam spot beam distribution is Poisson distribution, which is not uniform

Images