A kind of texturing additive suitable for monocrystalline silicon wafer and its application
A single crystal silicon wafer and additive technology, applied in the direction of single crystal growth, single crystal growth, sustainable manufacturing/processing, etc., can solve the problems of increased chemical alkali consumption, increased production cost, complex process flow, etc. The effect of production cost, consumption reduction and process simplification
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Embodiment 1
[0031] The method for texturing a single crystal silicon wafer of the present invention includes the following specific steps:
[0032] (1) Preparation of texturing additives: 0.1% sodium lignosulfonate, 0.01% glycerol polyether, 0.3% hydroxyethyl-β-cyclodextrin, 0.5% 1,4-bis (2-Hydroxyethyl) piperazine was added to the balance of deionized water, and mixed evenly to prepare a texturing additive;
[0033] (2) Preparation of texturing liquid: prepare 0.4wt% sodium hydroxide aqueous solution in the texturing tank, add the texturing additive of step (1) into the sodium hydroxide aqueous solution in a mass ratio of 1:100 and mix evenly , to get the fluffing liquid;
[0034] (3) Texturing: immerse the monocrystalline silicon wafer in the texturing solution obtained in step (2) for surface texturing, the texturing temperature is 83°C, and the texturing time is 7 minutes;
[0035] (4) Cleaning: The single-crystal silicon wafers textured in step (3) were washed with water and then i...
Embodiment 2
[0038] The method for texturing a single crystal silicon wafer of the present invention includes the following specific steps:
[0039] (1) Preparation of texturing additives: 0.2% sodium lignosulfonate, 0.02% glycerol polyether, 0.6% hydroxyethyl-β-cyclodextrin, 1.5% N-(2- Hydroxyethyl) piperazine is added to the balance of deionized water, and mixed evenly to prepare a texturing additive;
[0040] (2) Preparation of texturing liquid: prepare 0.7wt% sodium hydroxide aqueous solution in the texturing tank, add the texturing additive of step (1) into the sodium hydroxide aqueous solution in a mass ratio of 0.8:100 and mix evenly , to get the fluffing liquid;
[0041] (3) Texturing: immerse the monocrystalline silicon wafer in the texturing solution obtained in step (2) for surface texturing, the texturing temperature is 83°C, and the texturing time is 7 minutes;
[0042] (4) Cleaning: The single-crystal silicon wafers textured in step (3) were washed with water and then immer...
Embodiment 3
[0044] The method for texturing a single crystal silicon wafer of the present invention includes the following specific steps:
[0045] (1) Preparation of texturing additives: 0.1% sodium lignosulfonate, 0.01% sorbitol polyether, 0.5% carboxymethyl-β-cyclodextrin, 0.8% 1,4- Bis(2-hydroxyethyl)piperazine was added to the balance of deionized water, and mixed evenly to prepare a texturing additive;
[0046] (2) Preparation of texturing liquid: prepare 0.3wt% sodium hydroxide aqueous solution in the texturing tank, add the texturing additive of step (1) into the sodium hydroxide aqueous solution in a mass ratio of 0.8:100 and mix evenly , to get the fluffing liquid;
[0047] (3) Texturing: immerse the monocrystalline silicon wafer in the texturing solution obtained in step (2) for surface texturing, the texturing temperature is 83°C, and the texturing time is 7 minutes;
[0048] (4) Cleaning: The single-crystal silicon wafers textured in step (3) were washed with water and then i...
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