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Multi-megasonic focusing spray cleaning device and use method thereof

A spray cleaning device and spray cleaning technology are applied in the direction of using liquid cleaning methods, cleaning methods and utensils, chemical instruments and methods, etc., to achieve the effect of improving the propagation direction, cleaning efficiency and cleaning quality

Inactive Publication Date: 2021-10-01
SUZHOU UNIV OF SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The present invention provides a new type of multiple megasonic focused spray cleaning device, the purpose of which is to overcome the problems existing in the existing megasonic cleaning and improve the cleaning efficiency and cleaning quality

Method used

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  • Multi-megasonic focusing spray cleaning device and use method thereof
  • Multi-megasonic focusing spray cleaning device and use method thereof
  • Multi-megasonic focusing spray cleaning device and use method thereof

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Embodiment Construction

[0032] Below in conjunction with accompanying drawing and embodiment, the present invention will be further described:

[0033] A multiple megasonic focusing spray cleaning device includes machine tool components, multiple megasonic focusing spray cleaning components 1, a spray cleaning liquid pumping device 2, and an electrical control device.

[0034] The machine tool components include a base 8 , a two-dimensional motion platform 7 , a workpiece fixing platform 6 , a coarse adjustment mechanism 4 and a fine adjustment mechanism 3 .

[0035] The base 8 is arranged at the bottom of the multi-megasonic focusing spray cleaning device, the two-dimensional moving platform 7 is arranged above the base 8, the working stroke of the two-dimensional moving platform 7 is 400mm×400mm, and the workpiece fixing platform 6 is arranged on the two-dimensional moving platform 7 Above, the workpiece fixing platform 6 has an area of ​​420mm×420mm, the workpiece 5 is arranged above the workpiece...

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PUM

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Abstract

The invention discloses a multi-megasonic focusing spray cleaning device. The device comprises a machine tool part, a multi-megasonic focusing spray cleaning part, a spray cleaning liquid pumping device and an electrical control device; the machine tool part comprises a base, a workpiece fixing platform, a two-dimensional motion platform, a coarse adjustment mechanism and a fine adjustment mechanism; the multi-megasonic focusing spray cleaning part comprises a clamping and connecting device, megasonic focusing ceramic wafers, a wafer lining, megasonic coupling liquid and a spray cleaning liquid pump inlet; and the spray cleaning liquid pumping device comprises a spray cleaning liquid tank, a cleaning liquid pump and a cleaning liquid pipeline. The multiple groups of megasonic focusing ceramic wafers are adopted, the spray cleaning liquid is subjected to multi-megasonic focusing spraying, so that a workpiece is cleaned, micro-nano particles on parts such as the wafers can be effectively cleaned, and the cleaning efficiency and the cleaning quality are improved.

Description

technical field [0001] The invention relates to the technical field of spray cleaning, in particular to a multi-megasonic focusing spray cleaning device and a use method thereof. Background technique [0002] In the manufacture of semiconductor wafers, some pollutants such as particles, organics, metals and oxides will inevitably be introduced. In order to reduce the impact of impurities on the chip yield, it is not only necessary to improve the efficiency of a single cleaning in actual production, but also needs to be cleaned before and after almost all processes. They are cleaned frequently, and the cleaning step accounts for about 33% of the overall steps. The commonly used megasonic transducers for megasonic cleaning include flat plate type, arc plate type, etc. The megasonic transducer can be directly installed at the bottom of the tank body, the working frequency is between 800kHz-1MHz, and the power is between 100W-600W. In order to improve the cleaning ability of th...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B08B3/02B08B13/00
CPCB08B3/02B08B13/00B08B2203/0288
Inventor 殷振张鹏张坤刘子豪曹自洋田勇博黄彦瑛黄志蕾戴晨伟苗情
Owner SUZHOU UNIV OF SCI & TECH