Lifting device of MPCVD growth table

Abstract

The invention discloses a lifting device of an MPCVD growth table. The lifting device comprises a fixing device, a power device, an adjusting device and detection devices, wherein the fixing device is connected with the power device; the power device is in transmission connection with the adjusting device, and one side of the adjusting device is provided with a plurality of detection devices; and the detection devices are movably connected with the adjusting device. The fixing device comprises a frame, a workbench and a reaction chamber, and the workbench is arranged on the upper side of the frame; the frame is fixedly connected with the workbench, and the reaction chamber is arranged on the upper side of the workbench; a through hole is formed in the workbench, and an inlet is formed in the bottom side of the reaction chamber; the through hole of the workbench communicates with the inlet of the reaction chamber, and the adjusting device and the detecting device are arranged in the reaction chamber; a growth table is arranged on the upper side of the adjusting device, and fixedly connected with the adjusting device; the fixing device further comprises a base, and the base is fixedly connected with the frame; and the power device is arranged on one side of the base.

Description

technical field [0001] The invention relates to the technical field of MPCVD position adjustment, in particular to a lifting device for an MPCVD growth platform. Background technique [0002] Among all kinds of materials, diamond has outstanding properties such as high hardness, good thermal conductivity and excellent optical performance. However, diamonds can only be collected from nature in the past, and the cost is high, which is not suitable for large-scale use. With the continuous development of science and technology , artificial diamond has gradually become the main means of obtaining diamond material, which reduces the production cost and enables diamond to be used in a wide range. At present, the main methods to obtain diamond are hot wire method, DC arc plasma jet method and microwave method. Among these three diamond deposition techniques, the quality of diamond obtained by microwave plasma chemical vapor deposition (MPCVD) is higher, and it has become the most im...

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Problems solved by technology

[0003] In order to continuously improve the quality of diamond deposition, continuous research is still needed. However, in the existing structure, most of the diamond growth platforms are fixed and inconvenient to move. When the diamond is deposited, it is necessary to adjust the relative position of the growth platform and the plasma cluster to obtain For high-quality diamond, the height of the growth platform is not suitable, which will cut off the plasma, resulting in unstable clusters and affecting the deposition quality

In addition, the elevation of some growth platforms can only be adjusted by human eyes. When the plasma group in the reaction chamber reacts violently, it is inconvenient to observe, and it is easy to cause positioning failure. After the carbon source is plasmaized, it is easily affected by the disturbance of the air flow and flows disorderly. , so that the deposited diamond is uneven, and when the plasma turns into a solid phase, a large amount of heat will be released, and the uneven heating of the substrate will also affect the deposition quality

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