A lifting device for mpcvd growth platform

A lifting device and adjusting device technology, which is applied in metal material coating process, coating, gaseous chemical plating, etc., can solve the problems that can only be observed and adjusted by human eyes, uneven heating of the substrate, uneven diamond, etc. Achieve the effects of avoiding local over-density, improving deposition quality, and uniform deposition

Active Publication Date: 2022-02-11
SHANGHAI BOSHIGUANG SEMICON TECH CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] In order to continuously improve the quality of diamond deposition, continuous research is still needed. However, in the existing structure, most of the diamond growth platforms are fixed and inconvenient to move. When the diamond is deposited, it is necessary to adjust the relative position of the growth platform and the plasma cluster to obtain For high-quality diamond, the height of the growth platform is not suitable, which will cut off the plasma, resulting in unstable clusters and affecting the deposition quality
In addition, the elevation of some growth platforms can only be adjusted by human eyes. When the plasma group in the reaction chamber reacts violently, it is inconvenient to observe, and it is easy to cause positioning failure. After the carbon source is plasmaized, it is easily affected by the disturbance of the air flow and flows disorderly. , so that the deposited diamond is uneven, and when the plasma turns into a solid phase, a large amount of heat will be released, and the uneven heating of the substrate will also affect the deposition quality

Method used

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  • A lifting device for mpcvd growth platform
  • A lifting device for mpcvd growth platform
  • A lifting device for mpcvd growth platform

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Embodiment Construction

[0030] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0031] The invention provides technical solutions:

[0032] like Figure 1~9 As shown, a lifting device for an MPCVD growth platform includes a fixing device 1, a power device 2, an adjustment device 3 and a detection device 4, the fixing device 1 is connected to the power device 2, the power device 2 is connected to the adjustment device 3, and the adjustment device 3, a number of detection devices 4 are arranged on one side, and the detection devices 4 and ...

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Abstract

The invention discloses a lifting device for an MPCVD growth platform, which includes a fixing device, a power device, an adjusting device and a detection device, the fixing device is connected to the power device, the power device is connected to the adjustment device by transmission, and several detection devices are arranged on one side of the adjustment device , the detection device and the adjustment device are flexibly connected, the fixing device includes a frame, a workbench and a reaction chamber, the workbench is placed on the upper side of the frame, the frame and the workbench are tightly connected, the reaction chamber is arranged on the upper side of the workbench, and the workbench is provided with There is a through hole, an inlet is provided on the bottom side of the reaction chamber, and the through hole of the workbench is connected with the inlet of the reaction chamber. The reaction chamber is provided with a reaction chamber, and the adjustment device and the detection device are placed in the reaction chamber. The platform is firmly connected with the adjusting device, the fixing device also includes a base, the base is tightly connected with the frame, and a power device is arranged on one side of the base.

Description

technical field [0001] The invention relates to the technical field of MPCVD position adjustment, in particular to a lifting device for an MPCVD growth platform. Background technique [0002] Among all kinds of materials, diamond has outstanding properties such as high hardness, good thermal conductivity and excellent optical performance. However, diamonds can only be collected from nature in the past, and the cost is high, which is not suitable for large-scale use. With the continuous development of science and technology , artificial diamond has gradually become the main means of obtaining diamond material, which reduces the production cost and enables diamond to be used in a wide range. At present, the main methods to obtain diamond are hot wire method, DC arc plasma jet method and microwave method. Among these three diamond deposition techniques, the diamond obtained by microwave plasma chemical vapor deposition (MPCVD) is of higher quality and has become a preferred me...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C16/458
CPCC23C16/4581
Inventor 胡常青赵建海
Owner SHANGHAI BOSHIGUANG SEMICON TECH CO LTD
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