Preparation method of large-area grating

Abstract

The invention discloses a preparation method of a large-area grating. The preparation method comprises the following steps: S1, constructing an interference exposure light path; s2, selecting a photoresist and a substrate material required for preparing a large-area grating, and then sequentially carrying out the steps of spin coating and pre-baking; s3, presetting exposure time and exposing; s4, presetting developing time and developing; s5, observing whether the photoresist at the center of the substrate is completely dissolved or not, if so, reducing the developing time and executing the steps S2-S4 again, and if not, continuing to execute the step S6; S6, observing whether the duty ratio of the photoresist at the center of the substrate reaches the limit resolution of the photoresist or not, if so, continuing to execute step S7, and if not, increasing the exposure time and executing the steps S2-S5 again; and S7, measuring the area reaching the limit resolution of the photoresist, the area being the maximum area of the grating obtained by the interference exposure light path through exposure, and recording the exposure time and the development time at the moment. The manufacturing cost of the large-area grating is reduced.

Description

technical field [0001] The invention relates to the field of micro-nano processing, in particular to a method for preparing a large-area grating. Background technique [0002] Gratings have excellent optical properties and are widely used in modern production and life. However, in the existing manufacturing process, the larger the area of ​​the grating, the more expensive the preparation cost. It is of great significance to reduce the preparation cost of the large-area grating. [0003] In order to realize the production of large-area gratings, there have been many related explorations at home and abroad. It is mainly divided into two major exploration paths, namely nanoimprinting and holographic interference exposure. Nanoimprinting is a process in which a template with a nanoscale pattern is pressed onto a substrate coated with a polymer material under the action of mechanical force, and the pattern is imprinted and replicated in equal proportions. As a low-cost next-gen...

AI Technical Summary

Problems solved by technology

However, since the first step in the process of nanoimprinting needs to prepare the master template, the preparation of the master template by the existing technical route mainly uses the extremely high cost method of electron beam direct writing, and large-area electron beam direct writing takes time. The problem of long and extremely expensive cost, and the number of times that the general master template made of silicon can be recycled is less than 30 times, so the preparation cost of the nanoimprint master template is high in the process of preparing a large-area uniform grating in the prior art The problem

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