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Method for preparing super-hard bionic AR sheet through multi-arc ion plating and magnetron sputtering plating

A multi-arc ion plating and magnetron sputtering plating technology, applied in the field of AR, can solve the problems of high cost, inapplicability of 3D modeling, complicated process, etc., and achieve the effect of low cost and mass production

Active Publication Date: 2021-10-22
DONGGUAN JINGBO PHOTOELECTRIC BIT CO
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] And AR is to combine virtual things with real scenes and display them on the big screen synchronously through the on-site real scene and supplemented by computer software. However, the bionic AR technology currently on the market is generally realized by nanoimprinting technology, and the process is complicated and the cost is high. , and the larger the size, the higher the cost, and it is not suitable for 3D modeling

Method used

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  • Method for preparing super-hard bionic AR sheet through multi-arc ion plating and magnetron sputtering plating

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] A kind of method utilizing multi-arc ion plating and magnetron sputtering plating to prepare superhard bionic AR sheet, it comprises the following steps:

[0027] Step 1, cleaning and drying the substrate 3;

[0028] Step 2, using multi-arc ion plating, using arc discharge to quickly evaporate the silicon target to form droplets, and the droplets are deposited on the surface of the substrate 3 under the action of an electric field to form silicon nano-mastoids 2 with a thickness of 0.5 microns;

[0029] Step 3, magnetron sputtering silicon-coated optical film 1, the thickness of the optical film is within 300 nanometers to obtain a superhard bionic AR sheet.

[0030] The substrate 3 in step 1 is glass.

[0031] The nanomastoids described in step 2 are periodically arranged nanomastoids, and the nanomastoids are cones, cylinders or trapezoidal columns.

[0032] The diameter of the droplet in step 2 is controlled at 1um.

[0033] The cleaning is carried out with a sodi...

Embodiment 2

[0043] A kind of method utilizing multi-arc ion plating and magnetron sputtering plating to prepare superhard bionic AR sheet, it comprises the following steps:

[0044] Step 1, cleaning and drying the substrate 3;

[0045] Step 2, using multi-arc ion plating, using arc discharge to quickly evaporate the silicon target to form droplets, and the droplets are deposited on the surface of the substrate 3 under the action of an electric field to form silicon nano-mastoids 2 with a thickness of 2 microns;

[0046] Step 3, magnetron sputtering silicon-coated optical film 1, the thickness of the optical film is within 300 nanometers to obtain a superhard bionic AR sheet.

[0047] The substrate 3 in step 1 is sapphire.

[0048] The nanomastoids described in step 2 are periodically arranged nanomastoids, and the nanomastoids are cones, cylinders or trapezoidal columns.

[0049] The diameter of the droplet in step 2 is controlled at 1um.

[0050] The cleaning is carried out with a sod...

Embodiment 3

[0060] A kind of method utilizing multi-arc ion plating and magnetron sputtering plating to prepare superhard bionic AR sheet, it comprises the following steps:

[0061] Step 1, cleaning and drying the substrate 3;

[0062] Step 2, using multi-arc ion plating, using arc discharge to quickly evaporate the silicon target to form droplets, and the droplets are deposited on the surface of the substrate 3 under the action of an electric field to form silicon nano-mastoids 2 with a thickness of 3 microns;

[0063] Step 3, magnetron sputtering silicon-coated optical film 1, the thickness of the optical film is within 300 nanometers to obtain a superhard bionic AR sheet.

[0064] The substrate 3 in step 1 is glass.

[0065] The nanomastoids described in step 2 are periodically arranged nanomastoids, and the nanomastoids are cones, cylinders or trapezoidal columns.

[0066] The diameter of the droplet in step 2 is controlled at 1um.

[0067] The cleaning uses a sodium carbonate soluti...

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Abstract

The invention relates to the technical field of AR (Augmented Reality), in particular to a method for preparing a super-hard bionic AR sheet through multi-arc ion plating and magnetron sputtering plating. The method comprises the following steps: 1, cleaning and drying a substrate; 2, adopting multi-arc ion plating, rapidly evaporating a silicon target during arc discharge to form liquid drops, and depositing the liquid drops on the surface of the substrate under the action of an electric field to form a silicon nano mastoid with the thickness of 0.5-3 microns; and 3, carrying out magnetron sputtering plating on a silicon optical film, wherein the thickness of the optical film is within 300 nanometers, and obtaining the super-hard bionic AR sheet. The mode of combining multi-arc ion plating and magnetron sputtering plating is utilized, so that the bionic anti-reflection effect of the structure can be achieved, meanwhile, large-scale production can be achieved, the cost is low, and 3D modeling can be achieved.

Description

technical field [0001] The invention relates to the field of AR technology, in particular to a method for preparing superhard bionic AR sheets by using multi-arc ion plating and magnetron sputtering plating. Background technique [0002] 3D imitation imaging technology is a display method of optical imaging, which uses holographic glass or holographic film to achieve a very strong three-dimensional picture through the refraction, scattering, and even diffraction of light. [0003] And AR is to combine virtual things with real scenes and display them on the big screen synchronously through the on-site real scene and supplemented by computer software. However, the bionic AR technology currently on the market is generally realized by nanoimprinting technology, which has complicated processes and high costs. , and the larger the size, the higher the cost, and it is not suitable for 3D modeling. Contents of the invention [0004] In order to overcome the disadvantages and defi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/14C23C14/32C23C14/35
CPCC23C14/14C23C14/325C23C14/35
Inventor 徐仕立
Owner DONGGUAN JINGBO PHOTOELECTRIC BIT CO