Large-size plasma source with high emission current density

A technology of emission current density and plasma source, which is applied in the field of plasma physics and applied research, can solve the problems of small size, low emission current density, plasma instability, etc., and achieve the effect of large size and high emission current density

Pending Publication Date: 2021-11-16
合肥综合性国家科学中心能源研究院 +2
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] In order to solve the problems of small size and low emission current density of existing plasma sources, and to meet the requirements of physical parameters in the compact ring background plasma, to study plasma

Method used

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  • Large-size plasma source with high emission current density
  • Large-size plasma source with high emission current density
  • Large-size plasma source with high emission current density

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Embodiment Construction

[0035] In order to make the object, technical solution and advantages of the present invention clearer, the implementation of the present invention will be further described in detail below in conjunction with the accompanying drawings.

[0036] like Figure 1-4 As shown, a plasma source with a large size and high emission current density includes an anode, a cathode, a right-angle connector 8, a fixed flange, a vacuum sealing assembly, and a slotted copper rod 1, and the anode is connected to the opening through a right-angle connector 8 Groove copper rod 1 links to each other. The cathode is connected to the slotted copper rod 1 through a right-angle connector 8, the slotted copper rod 1 and the flange are sealed by a vacuum sealing assembly, and the side of the slotted copper rod 1 is cooled by circulating water and the inside acts as a current channel . The working environment of the anode and the cathode is a vacuum with a magnetic field, the cathode and the anode are f...

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Abstract

The invention discloses a large-size plasma source with high emission current density, and the plasma source comprises an anode, a cathode, a right-angle connector, a fixed flange, a vacuum sealing assembly and a slotted copper rod; the anode and the cathode are connected with the slotted copper rod through the right-angle connector, and the slotted copper rod and the fixed flange are sealed through the vacuum sealing assembly; circulating water cooling and internal conduction are carried out on the side face of the slotted copper rod, the working environment of the anode and the cathode is vacuum and has a magnetic field, the cathode and the anode are placed in the vacuum environment in parallel, the cathode and the anode discharge under the direct current or pulse condition, a current channel is generated between the anode and the cathode, and the current generated between the cathode and the anode is higher; the parameters of the generated plasma are higher, and large-spacing discharge can be realized. The plasma source can be used for researching basic physical problems such as magnetic field reconnection, plasma instability, drift wave turbulence and strip flow, and can also be used as a compact ring background plasma source to lay a foundation for a subsequent compact ring injection EAST device.

Description

technical field [0001] The invention relates to the field of plasma physics and application research, in particular to a plasma source with large size and high emission current density. Background technique [0002] In the existing tokamak feeding methods in the field of magnetic confinement fusion, it is difficult to realize core feeding. Throughout the development of the entire field of fusion technology, compact rings are currently the only technologies that have the potential for core feeding. It is particularly important to study the changes in physical parameters of compact rings injected into plasma. Therefore, it is necessary to generate a high-density background plasma to study the changes of plasma parameters after the compact ring is injected into the plasma, and lay the foundation for the future compact ring injection into the EAST device. There is no related experimental research so far. [0003] At present, hot cathode plasma sources mainly include thoriated t...

Claims

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Application Information

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IPC IPC(8): H05H1/24
CPCH05H1/24
Inventor 孟凡卫胡广海孔德峰张小辉叶扬赵志豪董期龙
Owner 合肥综合性国家科学中心能源研究院
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