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Photomask, exposure method and exposure system

A technology of photomask and exposure machine, which is applied in the field of exposure method, exposure system and photomask, can solve the problems of limited design width of splicing area, influence on picture display, and many splicing positions, so as to reduce splicing mura phenomenon, avoid splicing mura, Improve the effect of visual effects

Pending Publication Date: 2021-11-19
XIANYANG CAIHONG OPTOELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, due to the difference in manufacturing process, the existing splicing exposure method will cause uneven brightness of the display in the splicing area, resulting in various traces, that is, the splicing mura phenomenon; The design width is limited and there are many splicing positions
As the size of the panel increases, the splicing position and the number of splicing will also increase, resulting in more splicing mura, which affects the screen display

Method used

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  • Photomask, exposure method and exposure system
  • Photomask, exposure method and exposure system
  • Photomask, exposure method and exposure system

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0049] See figure 1 , figure 1 It is a schematic diagram of a mosaic design of a photomask pattern provided by an embodiment of the present invention. The photomask includes a photomask pattern formed by a transparent substrate and a light-shielding film; an exposure area 10 including several repeating units B is provided in the middle of the photomask pattern. A first effective pattern area 21 and a second effective pattern area 22 are respectively provided on both sides of the exposure area 10, and a third effective pattern area 31 is provided on the other side of the first effective pattern area 21, and the first effective pattern area 21 is provided on the other side of the first effective pattern area 21. The other side of the second active graphic area 22 is provided with a fourth active graphic area 32 .

[0050] In this embodiment, the exposure area 10 is the repeated exposure area in the middle of the mask, which is taken from the regular middle area of ​​the panel t...

Embodiment 2

[0067] On the basis of the first embodiment above, this embodiment also provides an exposure method, including:

[0068] Place the photomask provided in the first embodiment above between the panel and the exposure machine;

[0069] Partial areas of the photomask are respectively shielded by the light-shielding plate of the exposure machine, so as to perform regional exposure on the panel.

[0070] Specifically, the exposure method provided in this embodiment continues to take the 75"panel as an example, and uses the mask provided in the first embodiment above for splicing exposure, please refer to Figure 7 , Figure 7 It is a schematic diagram of a mask splicing exposure process provided by an embodiment of the present invention, and the specific process is as follows:

[0071] Step 1: Place a mask whose exposure area is half of the effective display area of ​​the panel between the panel and the exposure machine NSK.

[0072] Step 2: Take the first exposure.

[0073] Spe...

Embodiment 3

[0084] On the basis of the first embodiment above, this embodiment continues to provide a mask splicing design by taking the mask corresponding to the 75"panel as an example. Please refer to Figure 9 , Figure 9It is a schematic diagram of another mask design scheme corresponding to a 75"panel provided by the embodiment of the present invention. Wherein, the size of the exposure area 10 is half the size of the effective display area of ​​the panel minus the first effective display area. One-half of the size of the graphics area 21. The sizes of other areas are the same as the mask design corresponding to the 75"panel provided in the first embodiment above.

[0085] In this embodiment, since the size of the first effective graphic area 21 and the size of the second effective graphic area 22 are the same as the size of the mosaic area in the middle of the panel, the mask provided by this embodiment can be designed by repeating unit B The size of the panel minus half of the siz...

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Abstract

The invention discloses a photomask, an exposure method and an exposure system. The photomask comprises a photomask pattern formed by a transparent substrate and a shading film, an exposure area comprising a plurality of repeated units B is arranged in the middle of the photomask pattern, the edges of the two sides of the exposure area are provided with a first effective pattern area and a second effective pattern area respectively, a third effective pattern area is arranged on the other side of the first effective pattern area, and a fourth effective pattern area is arranged on the other side of the second effective pattern area. When the photomask provided by the invention is used for splicing exposure of a large-size panel, the exposure times can be reduced, so that the splicing times are reduced, the splicing mura phenomenon at the splicing part is reduced, and the display effect is improved.

Description

technical field [0001] The invention belongs to the field of display technology, and in particular relates to a photomask, an exposure method and an exposure system. Background technique [0002] Liquid crystal display is an active matrix liquid crystal display driven by thin-film transistor (TFT). The advantages of low radiation and low radiation have occupied a dominant position in the display field and are widely used. Mask (Mask), also known as photolithography mask, referred to as mask, is a graphic master used in the photolithography process commonly used in micro-nano processing technology, and is also a very important master in the manufacturing process of liquid crystal displays. It is composed of opaque The light-shielding film forms a mask graphic structure on the transparent substrate, and then transfers the graphic information to the product substrate through the exposure process. [0003] With the continuous development of display technology, the demand for d...

Claims

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Application Information

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IPC IPC(8): G03F1/50G03F7/20
CPCG03F1/50G03F7/2022
Inventor 张旭吴舜均朱欢欢田强强
Owner XIANYANG CAIHONG OPTOELECTRONICS TECH CO LTD
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