Anti-breakdown ion source discharge device

Abstract

The invention provides an anti-breakdown ion source discharge device. The device comprises a discharge chamber, a coil support, an upper insulation fixing block, a discharge component and an ion source chamber; the discharge component comprises a radio frequency coil, a lower conductive connecting piece and an upper conductive connecting piece; the radio frequency coil is fixed on a coil supporting seat; the coil supporting seat is clamped on the inner wall of the bottom of the ion source chamber; the coil support is arranged in the circumferential direction of the coil supporting seat; the radio frequency coil passes through the coil support; the upper conductive connecting piece sequentially bypasses the radio frequency coil and the coil supporting seat from the outside of the radio frequency coil, and extends into the bottom of the discharge chamber from the bottom of the coil supporting seat; and the upper insulation fixing block sleeves the upper conductive connecting piece and is fixed on the inner wall of the bottom of the ion source chamber. By increasing the distance between the upper conductive connecting piece and the bottom of the discharge chamber and the distance between the lower conductive connecting piece and the bottom of the discharge chamber, the phenomenon that the discharge chamber is broken down is solved.

Description

technical field [0001] The invention belongs to the field of mechanical processing equipment, in particular to a breakdown-proof ion source discharge device. Background technique [0002] The ion source device is a device that ionizes neutral atoms or molecules and extracts an ion beam from it. The ion beam has accurate track control, high ionization efficiency, good beam uniformity, wide energy adjustment range, and compatibility with reaction gases, etc. Advantages, widely used in ion beam etching, its performance has a crucial impact on the effect of ion implantation. The working principle of the RF ion source device is to use radio frequency power to ionize the gas to form plasma in the discharge chamber; the porous grid generates an accelerating electric field, and the ions are extracted and accelerated by the accelerating electric field, and then neutralized by the neutralizer to form a plasma beam. In the RF ion source device produced by KRI, long copper sheets are u...

AI Technical Summary

Problems solved by technology

Since the copper sheet is thin and not fixed, the long copper sheet and the short copper sheet naturally hang below the discharge chamber 1 (see figure 1 ), making the distance between the discharge chamber and the copper sheet uncontrollable. When the distance between the two is close, the discharge chamber will be broken down under the long-term action of the electric field, which increases the production cost

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