Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Power supply fabric and power supply clothes

A fabric and electropositive technology, applied in the direction of fabrics, textiles, friction generators, etc., can solve the problems of poor air permeability and achieve good waterproof performance, good antibacterial function, and good wearing thermal comfort effect

Pending Publication Date: 2021-11-30
BEIJING INSTITUTE OF TECHNOLOGYGY
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the wearable power supply fabric in the prior art is usually a composite structure of multi-layer functional layers, which has poor air permeability. Therefore, a new type of power supply fabric is needed to improve the air permeability, thereby improving the comfort of wearing products

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Power supply fabric and power supply clothes
  • Power supply fabric and power supply clothes
  • Power supply fabric and power supply clothes

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0071] refer to figure 1 and Figure 8 , this embodiment provides a power supply fabric, the power supply fabric is a single-layer plain weave fabric, specifically, Heavy weave fabrics, including:

[0072] Positively charged yarns and negatively charged yarns, the positively charged yarns and negatively charged yarns realize the storage and export of electrostatic friction induced charges through contact friction;

[0073] Functional yarn;

[0074] One or more of positively charged yarns, negatively charged yarns and functional yarns are used as warps of power supply fabrics; one or more of positively charged yarns, negatively charged yarns and functional yarns are used as power supply the weft of the fabric;

[0075] The positively charged yarn is suitable for connecting to the positive pole of the power supply of the device to be powered, and the negatively charged yarn is suitable for being connected to the negative pole of the power supply of the device to be powered....

Embodiment 2

[0086] refer to figure 2 and Figure 8 , the present embodiment provides a power supply fabric, the power supply fabric is a single-layer plain weave fabric, and the difference from Example 1 is that the power supply fabric is Weft heavy flat weave fabric.

[0087] The warp of the power supply fabric forms a warp buckling wave, the warp buckling wave includes the first warp cycle to the Nth warp cycle, N is a positive integer greater than 1, and the kth warp cycle includes the k first half warp cycle and the k second half warp cycle, k is a positive integer greater than 1 and less than N;

[0088] The weft of the power supply fabric forms a weft buckling wave, and the weft buckling wave includes the first weft cycle to the Mth weft cycle, M is a positive integer greater than 1, and the jth weft cycle includes the j first half weft cycle and the j second half weft cycle, j It is a positive integer greater than 1 and less than N.

[0089] The wefts of the power supply fabr...

Embodiment 3

[0094] refer to image 3 and Figure 9 , the present embodiment provides a power supply fabric, the power supply fabric is a single-layer plain weave fabric, and the difference from Example 1 is that the power supply fabric is Heavy flat weave fabric.

[0095] The warp of the power supply fabric forms a warp buckling wave, the warp buckling wave includes the first warp cycle to the Nth warp cycle, N is a positive integer greater than 1, and the kth warp cycle includes the k first half warp cycle and the k second half warp cycle, k is a positive integer greater than 1 and less than N;

[0096] The weft of the power supply fabric forms a weft buckling wave, and the weft buckling wave includes the first weft cycle to the Mth weft cycle, M is a positive integer greater than 1, and the jth weft cycle includes the j first half weft cycle and the j second half weft cycle, j It is a positive integer greater than 1 and less than N.

[0097] The wefts of the power supply fabric are...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a power supply fabric and a power supply clothes. The power supply fabric comprises electropositive yarn and electronegative yarn, and the electropositive yarn and the electronegative yarn achieve storage and export of electrostatic friction induction charges through contact friction; a functional yarn; one or more of the electropositive yarns, the electronegative yarns and the functional yarns are used as warps of the power supply fabric; one or more of the electropositive yarns, the electronegative yarns and the functional yarns are used as wefts of the power supply fabric; the electropositive yarn is suitable for being connected to a power supply anode of a to-be-powered device, and the electronegative yarn is suitable for being connected to a power supply cathode of the to-be-powered device. The power supply fabric realizes storage of inductive charges and diversion of induced current through mutual contact friction of yarns, so that external power supply is realized; a power supply effect can be realized in a single-layer fabric, so that the fabric is lighter and thinner.

Description

technical field [0001] The invention relates to the technical field of textiles, in particular to a power supply fabric and power supply clothing. Background technique [0002] With the development of wearable fabric technology in the research and application of medical monitoring and sensing of human physiological signals such as microelectronic communication technology, intelligent robots, unmanned systems, wearable combat equipment, brain electrical signals, muscle pulse, heart rate and blood pressure; And in the context of the low-power ubiquitous connection technology of the future 5G Internet of Things, the next generation of flexible electronic thin film skins, smart textiles, and flexible microelectronic integrated devices can realize remote connection and control through Internet of Things technology, and realize the application of diversified and complex scenarios. The next generation of intelligent functional flexible wearable devices, biotechnology sensing device...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): D03D15/533D03D15/47D03D15/50D03D15/56D03D15/283D03D15/275D03D15/267D03D15/258D03D15/233D03D15/225D03D15/208D03D13/00H02N1/04H02N1/06
CPCD03D15/533D03D15/47D03D15/283D03D15/258D03D15/275D03D13/00D03D13/008D03D15/267D03D15/56D03D15/235D03D15/225D03D15/208D03D15/50H02N1/04H02N1/06D10B2201/02D10B2331/04D10B2101/12D10B2321/042D10B2321/041D10B2321/021D10B2321/022D10B2101/06D10B2331/02D10B2331/10D10B2321/10D10B2321/06D10B2211/04D10B2201/24D10B2201/20D10B2201/00D10B2211/01
Inventor 陈人杰伍泓宇黄永鑫吴锋李丽孟倩倩梅杨官敏榕胡昕
Owner BEIJING INSTITUTE OF TECHNOLOGYGY
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com