Unlock instant, AI-driven research and patent intelligence for your innovation.

Liquid crystal glass low-pressure acid mist etching equipment and automatic control method thereof

A technology for liquid crystal glass and etching equipment, applied in the field of liquid crystal glass low-pressure acid mist etching equipment and its automatic control, can solve the problems of easy unbalanced contact and insufficient etching, so as to avoid excessive etching, improve etching quality, and reduce the rate of defective etching. Effect

Active Publication Date: 2021-12-03
BENGBU GAOHUA ELECTRONICS
View PDF7 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, in the actual process of spraying the glass substrate with liquid medicine, the contact between the spray and the entire surface of the glass substrate is likely to be uneven, resulting in differences in the etching progress of the glass substrate during the etching process. Some places are etched too much, and some places are not etched enough.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Liquid crystal glass low-pressure acid mist etching equipment and automatic control method thereof
  • Liquid crystal glass low-pressure acid mist etching equipment and automatic control method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0035] In the present invention, the atomizing device 2 produces atomized acid mist, and the atomizing device 2 conducts the acid mist to the acid mist etching cabin 1 through the conduction pipeline 3, and the top of the acid mist etching cabin 1 is provided with a plurality of spray nozzles 7, After the spray nozzle 7 is opened, the acid mist is sprayed into the inner space of the acid mist etching cabin 1 .

[0036] The conduction pipe 3 is provided with a flow sensor 4, the flow sensor 4 is used to sense and detect the conduction flow of the atomized acid mist, and transmit the conduction flow of the acid mist to the main control system, so that the main control system can supply the acid mist to the atomization device 2 Quantity is controlled.

[0037] An etching basket 6 is placed in the acid mist etching cabin 1, and a plurality of liquid crystal glasses to be etched are placed in the etching basket 6.

[0038] The negative pressure device 8 is arranged outside the acid ...

Embodiment 2

[0041] Based on Embodiment 1, in the present invention, a heating mechanism 11 is installed on one side of the acid mist etching cabin 1, one layer of corrosion-resistant insulation material layer inside the acid mist etching cabin 1, and a temperature sensor is arranged on the inner side of the heating mechanism 11, and the temperature sensor It is used for sensing and detecting the internal temperature of the acid mist etching chamber 1. The heating mechanism 11 is also connected with a ceramic heat-conducting rod 12 , and the ceramic heat-conducting rod 12 is arranged inside the acid mist etching chamber 1 in a detour. The spray nozzle 7 is located above the ceramic heat conduction rod 12 , and when the spray nozzle 7 sprays acid mist downward, it is heated by the ceramic heat conduction rod 12 .

Embodiment 3

[0043] Based on embodiment one and embodiment two, in the present invention, an infrared radiator 13 and an infrared receiver 14 are installed on one group of opposite sides of the acid mist etching cabin 1, and a plurality of infrared emitters 1301 are arranged on the infrared radiator 13 , the infrared receiver 14 is provided with a plurality of infrared receiving heads 1401, and the infrared receiving heads 1401 cooperate with the infrared emitting heads 1301 on the infrared radiator 13 one by one. The atomization detection area 15 is formed between a plurality of infrared emitting heads 1301 and infrared receiving heads 1401 that are matched one by one, and the atomization detection area 15 is located below the ceramic heat conducting rod 12 and above the etching basket 6, which is convenient for acid mist The acid mist formed before entering the etching basket 6 is preheated to improve the overall atomization degree.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses liquid crystal glass low-pressure acid mist etching equipment and an automatic control method thereof, and relates to the technical field of TFT-LCD deep processing. In the invention, negative pressure equipment comprises a negative pressure module communicated with an inner cavity of an acid mist etching cabin; the acid mist etching cabin is provided with an air pressure sensing mechanism for sensing the air pressure in the detection cabin in real time; a heating mechanism is arranged on one side of the acid mist etching cabin, and a ceramic heat conduction rod in heat conduction connection with the heating mechanism is arranged in the acid mist etching cabin; an infrared radiator is arranged on one side of the acid mist etching cabin, and an infrared receiver matched with the infrared radiator is arranged on the other side of the acid mist etching cabin. According to an infrared radiation detection mode, air pressure and temperature in the acid mist etching cabin are controlled, the acid mist etching cabin is filled with acid mist, so that the mist is attached to the surface of glass to achieve the etching effect, the whole-surface etching balance of the liquid crystal glass substrate is effectively ensured, the etching quality of the liquid crystal glass substrate is improved, and the etching defective rate of the liquid crystal glass substrate is reduced.

Description

technical field [0001] The invention belongs to the technical field of TFT-LCD deep processing, and in particular relates to a liquid crystal glass low-pressure acid mist etching device and an automatic control method thereof. Background technique [0002] In the existing process for etching liquid crystal glass substrates, the bottom of the immersion-type pre-treatment glass slag residue is not easy to handle, and uneven bubble bubbling may easily cause uneven etching. In addition, spray-type pre-treatment glass slag can easily block the nozzles of the pipeline, and uneven spraying can easily cause uneven etching. [0003] Existing patent document 1, authorized announcement number: CN101630635B, patent name: glass substrate etching device, main technical content: including the reaction chamber, the fixing device located in the reaction chamber for vertically fixing the glass substrate, and the liquid medicine communicated with the reaction chamber The storage tank and the ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C03C15/00
CPCC03C15/00
Inventor 张小虎程秀文
Owner BENGBU GAOHUA ELECTRONICS