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A mobile device for testing the glossiness of silicon wafer surface

A mobile device and a technology on the surface of a silicon wafer, which is applied in the direction of measuring devices, scattering characteristics measurement, and material analysis through optical means, can solve problems such as doubtful detection quality, difficulty in uniform quantification of samples, and low detection efficiency, and achieve accuracy assurance , Improve the effect of detection quality and detection efficiency

Active Publication Date: 2022-05-06
山东天大清源信息科技有限公司
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  • Abstract
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  • Claims
  • Application Information

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Problems solved by technology

[0005] At present, third-party inspection agencies generally use hand-held glossmeters to test the glossiness of each point on the surface of the silicon wafer. This operation method has the following defects: manual operation makes the distance and angle of the test points not in place. In this situation, the test data fluctuates greatly, the test quality is questionable, the test efficiency is low, and it is difficult to uniformly quantify the samples sent by various enterprises

Method used

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  • A mobile device for testing the glossiness of silicon wafer surface
  • A mobile device for testing the glossiness of silicon wafer surface
  • A mobile device for testing the glossiness of silicon wafer surface

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Embodiment

[0037] Such as Figure 1-Figure 4 As shown, a mobile device for testing the surface gloss of a silicon wafer includes a workbench 1 on which a horizontal centerline 29 is arranged, and a circular bubble level 30 is arranged on the horizontal centerline 29 . The four corners below the workbench 1 are respectively provided with height-adjusting pads 27, and the rotation of the height-adjusting pads 27 can make the bubbles in the circular bubble level 30 reach the central position so that the upper surface of the workbench 1 is level. The workbench 1 is provided with a work board 2, a test instrument carrier and a display PLC controller 24; the upper surface of the work board 2 is used to place the silicon wafer sample 3, and the test instrument carrier is used to carry the gloss meter 6, the gloss The detection port of the instrument 6 faces the upper surface of the working board 2, and the display PLC controller 24 is integrated with a display screen and a loudspeaker.

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Abstract

The invention relates to a mobile device for testing the glossiness of the surface of a silicon wafer, which comprises a workbench, on which a workboard, a test instrument bearing frame and a display PLC controller are arranged; the workboard is used for placing silicon wafer samples, and the test instrument The supporting frame is used to carry the gloss meter, and the detection port of the gloss meter faces the upper surface of the working plate; the testing instrument supporting frame includes a bracket, a vertical lifting mechanism, a rotating mechanism and a horizontal linear moving mechanism; the bracket is fixed on the workbench, and the vertical The vertical lifting mechanism is fixed on the bracket, the vertical lifting mechanism drives the rotating mechanism to lift, the rotating mechanism drives the horizontal linear moving mechanism to rotate, and the horizontal linear moving mechanism drives the gloss meter to move horizontally. The axis of rotation coincides. This technical solution replaces the manual operation mode, eliminates the influence of human interference factors on the test results, improves the detection quality and detection efficiency, and realizes the unified quantification of the operation steps of each sample.

Description

technical field [0001] The invention relates to the technical field of silicon wafer quality detection, in particular to a mobile device for testing the glossiness of the silicon wafer surface. Background technique [0002] Surface gloss is a surface characteristic of an object, which is used to indicate the strength of the object's surface for diffuse reflection of light. As one of the indicators for evaluating the surface quality of silicon wafers, the glossiness of the silicon wafer surface is gradually valued and controlled by various semiconductor factories. [0003] In the back-end device process of silicon wafers for integrated circuits, process equipment for process temperature detection and temperature control through the back of the silicon wafer will be used. When using these equipment to process device products, the detection value of the process temperature and the final actual process temperature The output will be affected by the glossiness of the backside of...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01N21/57G01N21/01F16M11/04F16M11/18
CPCG01N21/57G01N21/01F16M11/04F16M11/18
Inventor 袁恒
Owner 山东天大清源信息科技有限公司
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