Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Novel foot-controlled multifunctional nitrogen purging device

A nitrogen purging and multi-functional technology, applied in the direction of cleaning methods, cleaning methods and utensils, chemical instruments and methods using gas flow, etc., can solve problems such as lower reliability, pad damage, secondary damage, etc., to achieve Energy-saving, good economic benefits, and great flexibility

Pending Publication Date: 2022-03-04
CETC CHIPS TECH GRP CO LTD
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This causes the human body to maintain a posture for a long time, which wastes manpower and is less efficient
At the same time, using tweezers to grasp the edge of the component is likely to cause damage to the pad position, causing secondary damage and reducing reliability

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Novel foot-controlled multifunctional nitrogen purging device
  • Novel foot-controlled multifunctional nitrogen purging device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0018] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0019] Such as figure 1 As shown, a new foot-controlled multifunctional nitrogen purging device includes: circuit breaker 1, DC switch 2, first solenoid valve 3, second solenoid valve 4, nitrogen foot switch 5, vacuum foot switch 6 , high-pressure nitrogen interface 7, vacuum interface 8, nitrogen quick connector 9, vacuum quick connector 10, nitrogen purge gun head 11 and vacuum gun head 12; circuit breaker 1 is connected to DC switch 2, and DC switch 2 is re...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a novel foot-controlled multifunctional nitrogen purging device. The device comprises a circuit breaker, a direct-current switch, a first electromagnetic valve, a second electromagnetic valve, a nitrogen foot switch, a vacuum foot switch, a high-pressure nitrogen interface, a vacuum interface, a nitrogen quick connector, a vacuum quick connector, a nitrogen purging gun head and a vacuum gun head, the circuit breaker is connected with the direct-current switch; the direct-current switch is connected with the nitrogen foot switch, the vacuum foot switch, the first electromagnetic valve and the second electromagnetic valve respectively; the first electromagnetic valve is further connected with a nitrogen foot switch, a high-pressure nitrogen connector and a nitrogen quick connector, and the second electromagnetic valve is further connected with a vacuum foot switch, a vacuum connector and a vacuum quick connector. The nitrogen purging gun head is connected with the nitrogen quick connector, and the vacuum gun head is connected with the vacuum quick connector; according to the device, damage caused by improper clamping of the components through tweezers is avoided, the purging operation efficiency is higher, the reliability and the sheet forming rate of the components are improved, and good economic benefits are achieved.

Description

technical field [0001] The invention belongs to the field of semiconductors, and in particular relates to a novel foot-controlled multifunctional nitrogen purging device. Background technique [0002] In the photolithography process in the semiconductor field, although every step before photolithography (oxidation, doping, etc.) is completed in a clean area, the surface of the chip may adsorb some particulate pollutants, greatly reducing reliability. In order to ensure that the photoresist and the surface of the wafer can be well bonded, the surface must be cleaned of particles, and the use of high-pressure nitrogen purge is a commonly used method of particle removal. [0003] The traditional operation is usually to connect the nitrogen source with the nitrogen gun. The craftsmen hold the nitrogen purge gun with one hand, and use the other hand to clamp the chip with tweezers for purging. This causes the human body to maintain a posture for a long time, which wastes manpowe...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B08B5/02B08B13/00
CPCB08B5/02B08B13/00
Inventor 张语哲彭斌李炜徐颖
Owner CETC CHIPS TECH GRP CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com