Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Wafer processing equipment

A processing equipment and wafer technology, applied in stone processing equipment, sustainable manufacturing/processing, work accessories, etc., can solve problems affecting yield, wafer tearing, affecting processing efficiency, etc., to ensure cutting quality and guarantee Accuracy, the effect of ensuring completeness

Active Publication Date: 2022-03-25
江苏威森美微电子有限公司
View PDF8 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] In order to make up for the deficiencies of the existing technology, it needs to be cut during the processing of the wafer. During the cutting process, waste will be generated, and the waste and the wafer are easily adhered, resulting in tearing and deformation of the wafer. After deformation, It cannot be found in time, and continuing processing will affect the yield of processing. At the same time, after cutting, multi-process inspection is required, which affects the processing efficiency. A wafer processing equipment proposed by the present invention

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Wafer processing equipment
  • Wafer processing equipment
  • Wafer processing equipment

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0031] like Figure 1 to Figure 7As shown, a wafer processing equipment according to the present invention includes a movable frame 1, a driven rod 2, a limit plate 3, a screw rod 4, a motor 5, a mounting frame 6, an active rod 7, a sliding cavity 8, and a suction cup 9. Fixed frame 10, second baffle plate 11, light receiver 12, warning light 13, cutting cylinder 101, pneumatic rod 102, cutting knife 103, first reed 104, swing ring 105, swing lever 106, connecting rod 107 , roller 108, sleeve 201, limit rod 202, electrode ball 203, installation rod 204, limit cap 205, second reed 206, electrode ring 207, first baffle 208, needle 209 and toggle rod 210, The inside of movable frame 1 is provided with sliding cavity 8, and mounting frame 6 is fixed on the bottom side inner wall of sliding cavity 8, and motor 5 is installed on one side of mounting frame 6, and screw mandrel 4 is installed on the rotating shaft of motor 5, and sliding cavity 8 There are three sliding holes in the ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention belongs to the technical field of semiconductor processing, and particularly relates to wafer processing equipment which comprises a movable frame, a driven rod, a limiting plate, a light receiver and a warning lamp, under the cooperation of a first reed, a roller on one side is attached to the surface of a wafer to press and fix the wafer, and a roller on the other side presses waste materials to guarantee that the waste materials are not damaged after cutting. Waste materials are not adhered, meanwhile, it is guaranteed that the cutting side is not deformed, it is guaranteed that tearing damage does not exist in the wafer cutting process, the integrity of the wafer is guaranteed, the cutting yield is improved, needle head swinging is achieved, the inner wall of a notch of an electrode ring makes contact with an electrode ball, an alarm can be powered on, an alarm can be given out, and meanwhile an alarm signal is transmitted into a PLC processor. A shutdown command is issued through the PLC processor, shutdown operation is achieved, scrapped wafers are processed, meanwhile, equipment is maintained, the accuracy of follow-up operation is guaranteed, the cutting quality of the wafers is guaranteed, the yield is improved, the cutting stability is monitored, and the production efficiency can be improved.

Description

technical field [0001] The invention belongs to the technical field of semiconductor processing, in particular to wafer processing equipment. Background technique [0002] A semiconductor refers to a material whose conductivity at room temperature is between that of a conductor and an insulator. Semiconductors are widely used in radios, televisions, and temperature measurement. For example, diodes are devices made of semiconductors. A semiconductor refers to a material whose conductivity can be controlled and ranges from an insulator to a conductor. Whether from the perspective of technology or economic development, the importance of semiconductors is very huge. Most of today's electronic products , such as computers, mobile phones or digital recorders, the core units are closely related to semiconductors. Common semiconductor materials include silicon, germanium, gallium arsenide, etc., and silicon is among various semiconductor materials. It is widely used in commercial a...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B28D5/04B28D7/04B28D7/00G08B7/06G08B21/18H01L21/304
CPCB28D5/042B28D5/0064B28D5/0094B28D5/0058B28D5/0082H01L21/304G08B21/18G08B7/06Y02P70/50
Inventor 柳天勇叶林旺胡长文
Owner 江苏威森美微电子有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products