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Nanoimprint template and manufacturing method thereof

A technology of nanoimprinting and manufacturing methods, applied in the field of nanoimprinting, which can solve the problems of high product cost and unsatisfactory effects, and achieve the effects of avoiding high temperature connection, reducing stress and strain, and offsetting stress and strain

Pending Publication Date: 2022-04-01
苏州新维度微纳科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the existing technical solutions, in order to eliminate the influence of stress in the template manufacturing process and imprinting process, there is a spring layer structure, but the effect is not ideal, and the product cost is high

Method used

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  • Nanoimprint template and manufacturing method thereof

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Embodiment Construction

[0020] The specific embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings, but it should be understood that the protection scope of the present invention is not limited by the specific embodiments.

[0021] Unless expressly stated otherwise, throughout the specification and claims, the term "comprise" or variations thereof such as "includes" or "includes" and the like will be understood to include the stated elements or constituents, and not Other elements or other components are not excluded.

[0022] As mentioned in the background, existing nanoimprint templates cannot effectively overcome the stress and strain generated during template manufacturing and template use. According to the nanoimprint template in the embodiment of the present invention, the materials to effectively relieve the stress problem of the nanoimprint template.

[0023] Such as figure 1 As shown, the nanoimprint template according to an emb...

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Abstract

The invention discloses a nanoimprint template and a manufacturing method thereof. The nanoimprint template includes a substrate and a unit structure formed on the substrate. The substrate comprises a base (1), a first microstructure array layer (2), a first bonding layer (4), a first flexible layer (11) and a base layer (13). The first microstructure array layer comprises a plurality of first microstructures which are separated by first cavities (3). And the first bonding layer (4) is arranged above the first microstructure array layer (2) and is bonded with the upper surface of the first microstructure array layer (2) at low temperature. A first insertion layer (5) is disposed on the first bonding layer. A first flexible layer (11) is disposed over the first insertion layer. A base layer (13) is disposed over the first flexible layer (11). The nanoimprint template provided by the invention can effectively reduce the stress problem generated in the template manufacturing process and the template using process.

Description

technical field [0001] The invention relates to nanoimprint technology, in particular to a nanoimprint template and its preparation process. Background technique [0002] As one of the core technologies leading the future scientific and technological revolution, nanotechnology has attracted great attention from the scientific and industrial circles. In the 1990s, the "Nanostructure Laboratory of the University of Minnesota" in the United States proposed and demonstrated a new technology called "nanoimprinting", which has the unique advantages of high resolution, low cost, and mass production. One of the most promising fabrication techniques for micro-nanostructures. [0003] Nanoimprinting is mainly divided into thermal imprinting and UV imprinting. Thermal embossing is the earliest developed nano-imprinting technology, but because it requires high temperature and high pressure, the surface structure and material of the imprinting template are prone to thermal expansion, w...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/00
Inventor 罗刚
Owner 苏州新维度微纳科技有限公司