Display device and manufacturing method thereof
A technology for display devices and substrates, applied in semiconductor/solid-state device manufacturing, electrical components, diodes, etc., can solve the problems of increasing the manufacturing process and manufacturing cost, and achieve the effect of simplifying the manufacturing process
Pending Publication Date: 2022-04-01
SAMSUNG DISPLAY CO LTD
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Problems solved by technology
Due to the additional mask process, the manufacturing process and manufacturing cost may be increased
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[0049] Hereinafter, a plurality of embodiments of the present invention will be described in detail with reference to the drawings to make those who have basic knowledge in the art of the present invention can be readily implemented. The present invention can be implemented as a variety of different forms, not limited to the embodiments described herein.
[0050] In order to clearly illustrate the invention, a portion independent of the description is omitted, and the same or similar constituent elements are given the same reference numerals throughout the specification.
[0051] Further, in order to facilitate explanation, the size and thickness of the respective configurations shown in the drawings are arbitrarily shown, and thus the present invention is not necessarily limited to the illustration. In the drawings, the thickness is shown in order to express the plurality of layers and regions. Also, in the drawings, in order to facilitate explanation, the thickness of the partia...
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The invention relates to a display device and a manufacturing method thereof. A display device according to the present embodiment includes: a first substrate; a plurality of metal layers on the first substrate and spaced apart from each other; a buffer layer on the plurality of metal layers; the semiconductor layer is located on the buffer layer; the gate conductive layer is located on the semiconductor layer; the data conducting layer is connected with the semiconductor layer; and a light emitting element connected to the data conductive layer, the plurality of metal layers including a first portion overlapping a portion of the semiconductor layer in a third direction perpendicular to a surface of the first substrate, a second portion overlapping a portion of the semiconductor layer in a second direction perpendicular to a surface of the first substrate, and a third portion overlapping a portion of the semiconductor layer in a third direction perpendicular to the surface of the first substrate. The second part is a part which is completely overlapped with the semiconductor layer in the third direction, and the third part is a part which is not overlapped with the semiconductor layer in the third direction.
Description
Technical field [0001] The present invention relates to a display device and a method of manufacturing the display device, and more particularly to a method for producing a display device of a metal layer and a semiconductor layer by the same process, and a display device manufactured by the method. Background technique [0002] A display device including a thin film transistor has been widely commercialized. The thin film transistor includes a gate electrode, an active layer, a source electrode, and a drain electrode. According to the structure arranged according to the electrode, the thin film transistor may have a structure in which the active layer is located on the gate electrode or the gate electrode is located on the active layer. [0003] For the structure of the gate electrode on the active layer, the active layer is directly exposed to light flowing from the lower portion of the substrate. Therefore, leakage current may occur in the active layer, and may occur, such as ...
Claims
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IPC IPC(8): H01L27/15H01L27/32
CPCH10K59/38H10K59/131H10K59/1201H10K59/8792H01L25/0753H01L23/525H01L23/481H01L21/0274H01L27/1214H01L33/62H01L2933/0066
Inventor 沈承辅权昶佑金俸均金鎭奭朴孝淑吴浩吉李应揆任完淳崔埈厚
Owner SAMSUNG DISPLAY CO LTD