Plating solution full-automatic analysis method and computer readable storage medium

A fully automated and analytical method technology, applied in the direction of material analysis, material analysis by electromagnetic means, material electrochemical variables, etc., can solve problems such as difficult to realize automatic analysis, and achieve the effect of ensuring the accuracy and correctness of the analysis

Pending Publication Date: 2022-04-05
深圳日山科技有限公司
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] In view of this, the present invention proposes a fully automatic analysis method for plating solution. By setting high and low positive potentials in the pure electroplating solution and running CVS to clean the rotating disc electrode and obtain

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Plating solution full-automatic analysis method and computer readable storage medium
  • Plating solution full-automatic analysis method and computer readable storage medium
  • Plating solution full-automatic analysis method and computer readable storage medium

Examples

Experimental program
Comparison scheme
Effect test

Example Embodiment

[0024] In order to make the technical solutions of the present invention more obvious and easy to understand, the following examples are given to further illustrate the present invention, together with the accompanying drawings. The specific embodiment of the present invention proposes a fully automatic analysis method of the plating solution, aiming at realizing continuous automatic analysis of additives in the plating solution, figure 1 is the flow chart of the method. Please refer to figure 1 , the method includes the following steps S1-S5:

[0025] Step S1 , in the pure plating solution, run electrochemical voltammetry with specified parameters, and obtain the reference potential offset and the stripping power from the potential, current and time data. It should be understood that, the plating solution here can be copper electroplating solution, zinc electroplating solution, tin electroplating solution or nickel electroplating solution, etc., which is not limited thereto...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a plating solution full-automatic analysis method and a computer readable storage medium, and the method comprises the following steps: S1, in a pure plating solution, operating an electrochemical voltammetry by adopting specified parameters, and obtaining a reference potential offset and a stripping electric quantity from potential, current and time data; s2, judging whether the reference potential offset is greater than a first preset threshold value or not; if yes, compensating the reference potential offset in the electrochemical voltammetry parameters and then returning to S1; otherwise, entering the step S3; s3, judging whether the error between the stripping electric quantity and the standard value is greater than a second preset threshold value or not; if yes, using the electrochemical voltammetry parameters for cleaning the electrode to operate the electrochemical voltammetry to clean the electrode, and then returning to S1; otherwise, entering the step S4; s4, operating the electrochemical voltammetry activation electrode by adopting the electrochemical voltammetry parameters for analyzing the sample, and then operating the electrochemical voltammetry to analyze the concentration of the sample; s5, judging whether a next sample exists or not; if yes, the steps S1 to S4 are repeated; and if not, finishing the analysis.

Description

technical field [0001] The invention relates to the technical field of electroplating, in particular to a fully automatic analysis method for a plating solution and a related computer-readable storage medium. Background technique [0002] In the electroplating process, the control of the concentration of additives in the plating solution is particularly important. The concentration of additives directly affects the qualified rate of electroplating, and ultimately can affect the qualified rate of products. [0003] CVS (Cyclic Voltammetry Stripping, cyclic voltammetry stripping) electroplating analysis technology is an electrochemical method to determine the concentration of additives by analyzing the influence of additives on the electroplating deposition rate on the rotating disk electrode. CVS can be used to analyze organic additives in electroplating solutions, such as leveling agents, brighteners, carriers, etc. The concentration of these organic additives can directly ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): G01N27/416G01N27/38
Inventor 孙耀峰周卫娟
Owner 深圳日山科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap