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Automatic cleaning tank for semiconductor wafer tank cleaning machine

An automatic cleaning and washing machine technology, applied in cleaning methods and utensils, cleaning methods using liquids, chemical instruments and methods, etc., can solve problems such as unfavorable chemical cleaning liquid reflux temperature control, unfavorable overall linkage and energy saving, rectangular cleaning tank volume Large and other problems, to achieve the effect of reducing the volume, reducing the occupied volume, and increasing the inner area

Active Publication Date: 2022-05-27
ZHICHENG SEMICON EQUIP TECH (KUNSHAN) CO LTD
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  • Summary
  • Abstract
  • Description
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AI Technical Summary

Problems solved by technology

[0004] Based on the large volume of the existing rectangular cleaning tank for wafer cleaning equipment, which is not conducive to the backflow temperature control of the chemical cleaning liquid, there is a certain cleaning dead angle, the cleaning is not thorough, and it is not conducive to the technical problems of overall linkage and energy saving. The present invention proposes Automatic cleaning tank for semiconductor wafer tank cleaning machine

Method used

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  • Automatic cleaning tank for semiconductor wafer tank cleaning machine
  • Automatic cleaning tank for semiconductor wafer tank cleaning machine
  • Automatic cleaning tank for semiconductor wafer tank cleaning machine

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Embodiment Construction

[0049] The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, but not all of the embodiments.

[0050] refer to Figure 1-15 , an automatic cleaning tank for a semiconductor wafer tank cleaning machine, comprising a frame 1, and a groove cover 11 installed on the frame 1, a cleaning tank body 12, a supporting device, a filtering device and a washing device;

[0051] like Figure 1-2 As shown, two slot covers 11 are hingedly arranged on both sides of the top of the frame 1, and a micro motor for driving the hinged slot covers 11 to open and close is arranged in the axial direction thereof, which is convenient for control in the dust-free workshop. Cleaning liquid, especially chemical cleaning liquid, needs to clean the wafer after hea...

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Abstract

The invention belongs to the technical field of wafers, in particular to an automatic cleaning tank for a semiconductor wafer tank cleaning machine, comprising a rack, a tank cover, a cleaning tank body, a supporting device and a filtering device mounted on the rack. and a washing device; the two tank covers are hingedly arranged on both sides of the top of the rack, and the cleaning tank body is fixedly mounted on the inner wall of the rack. The automatic cleaning tank used in the semiconductor wafer tank cleaning machine can support the wafer by providing a support device and a rinse device, and at the same time, it can drive the wafer to rotate during the cleaning process, and rinse the wafer in an all-round way. Using the space in the sidewall of the flower basket, the rollers are inserted to hold up the wafer, and then the rotation is realized. At the same time, the nozzle holes of a part of the rotating nozzle are set to be eccentric, and then the water pressure driven by the pump is used to drive the rotation to solve the dead angle of cleaning. The problem is solved, and the technical problem that the existing wafer cleaning equipment has a certain cleaning dead angle in the cleaning of the wafer is solved.

Description

technical field [0001] The invention relates to the technical field of wafers, in particular to an automatic cleaning tank for a semiconductor wafer tank cleaning machine. Background technique [0002] Wafer refers to the silicon wafer used in the manufacture of silicon semiconductor integrated circuits. Because of its circular shape, it is called a wafer; it can be processed into various circuit element structures on the silicon wafer, and become an IC with specific electrical functions. product. [0003] The existing wafer needs to be cleaned during production. The rectangular cleaning tank in the existing cleaning equipment is large in size, which is not conducive to the reflow temperature control of the chemical cleaning solution; when the wafer is cleaned, the flower basket is directly placed in the cleaning tank , and then the cleaning solution is sprayed upward from the bottom for cleaning. This cleaning can only achieve vertical cleaning, there is a certain problem ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B08B3/02B08B3/08B08B13/00
Inventor 华斌孙先淼
Owner ZHICHENG SEMICON EQUIP TECH (KUNSHAN) CO LTD
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