Parameter anomaly detection method and semiconductor process equipment

Abstract

The embodiment of the invention provides a parameter anomaly detection method and semiconductor process equipment, the process of the semiconductor process equipment comprises a plurality of process steps which are carried out in sequence, and the parameter anomaly detection method comprises the following steps: collecting actual parameter values of a target parameter at each preset time point in the process steps; dispersing the actual parameter value of the target parameter into a pre-acquired parameter relation graph, and when the actual parameter value, changing along with the preset time precision, of the target parameter at the preset time point and a normal parameter value, corresponding to the preset time point, in the parameter relation graph meet a preset abnormal condition, determining the target parameter according to the preset abnormal condition. Determining that the target parameter in the process step is abnormal, wherein the parameter relation graph is a relation graph that the normal parameter value of the target parameter in the process step changes along with each preset time point; adjusting the process according to an adjustment scheme corresponding to the preset abnormal condition; and outputting prompt information corresponding to the preset abnormal condition. By adopting the parameter anomaly detection method provided by the invention, the parameter anomaly detection efficiency can be improved.

Description

technical field [0001] The invention relates to the technical field of semiconductors, in particular to a parameter anomaly detection method and semiconductor process equipment. Background technique [0002] The technological process is also called "processing flow" or "production flow". Refers to the whole process of continuous processing in sequence from the input of raw materials to the output of finished products through certain production equipment or pipelines. A complete technological process usually includes several working procedures. In the process flow involving the manufacture of process equipment, the fluctuation of some target parameters (such as temperature, flow rate, radio frequency and pressure, etc.) directly affects the process results, and seriously will cause rework and affect the production capacity of the equipment. [0003] The current parameter anomaly detection scheme is relatively simple and solidified in the detection of abnormal parameters. It...

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Problems solved by technology

[0004] The technical problem to be solved by the embodiment of the present invention is that the detection of abnormal parameters is not timely and the efficiency is not high

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