Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Shear bulk acoustic resonator and manufacturing method thereof

The technology of a bulk acoustic wave resonator and its manufacturing method, which is applied in the field of resonators, can solve problems such as the influence of the device Q value and the energy leakage of parasitic modes, and achieve the effects of reducing clutter, reducing parasitic modes, and suppressing transverse resonance

Pending Publication Date: 2022-04-29
HANGZHOU SAPPLAND MICROELECTRONICS TECH CO LTD
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, for XBAR devices, there are often spurious modes such as S0 and A0 near the A1 mode. The existence of these spurious modes not only leads to a lot of clutter on the admittance characteristic curve of the XBAR resonator, but also the spurious modes will cause energy leakage. The Q of the device will also be significantly affected by the

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Shear bulk acoustic resonator and manufacturing method thereof
  • Shear bulk acoustic resonator and manufacturing method thereof
  • Shear bulk acoustic resonator and manufacturing method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0041] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. When the following description refers to the accompanying drawings, the same numerals in different drawings refer to the same or similar elements unless otherwise indicated. The implementations described in the following exemplary embodiments do not represent all implementations consistent with this application. Rather, they are merely examples of apparatuses and methods consistent with aspects of the present application as recited in the appended claims. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.

[0042] T...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a shear bulk acoustic wave resonator which comprises a substrate and a piezoelectric substrate, the back of the piezoelectric substrate is attached to the substrate, and a cavity is formed in the side, facing the piezoelectric substrate, of the substrate; a lower interdigital transducer located in the cavity is arranged on the back face of the piezoelectric substrate, an upper interdigital transducer is arranged at the position, symmetrical to the lower interdigital transducer, of the front face of the piezoelectric substrate, and the electrode polarity, corresponding to the position of the upper interdigital transducer, of the lower interdigital transducer is the same as the electrode polarity, corresponding to the position of the upper interdigital transducer. The two sides of the piezoelectric substrate are provided with the interdigital transducers which are opposite in position, and the polarities of the interdigital transducers are the same, so that polarization electric fields generated on the upper surface and the lower surface of the piezoelectric substrate in the thickness direction offset each other, the displacement component in the thickness direction during mass point polarization is reduced, clutters on an admittance curve are reduced, and the impedance of the mass point is improved. And the Q value of the device is also improved.

Description

technical field [0001] The invention belongs to the technical field of resonators, and in particular relates to a shear bulk acoustic wave resonator and a manufacturing method thereof. Background technique [0002] With the increasing popularity of 5G technology, radio frequency communication technology is facing the challenges of higher frequency, larger relative bandwidth and higher power; traditional SAW and TC-SAW are limited by power density and lithography technology development, and it is difficult to apply 3.5 For scenarios above GHz, it is difficult for BAW and FBAR technologies to achieve a relative bandwidth of more than 8%, regardless of whether the piezoelectric layer uses AlN or Sc-doped AlN. [0003] Using XBAR (shear bulk acoustic resonator) technology can effectively solve the above problems, by bonding LiNbO on the substrate 3 Single crystal thin plate, and metal electrodes are prepared on LN to excite shear body waves, which can be regarded as A1 mode Lam...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H03H9/17H03H3/02H03H9/13
CPCH03H9/171H03H3/02H03H9/13H03H9/02228H03H9/174H03H9/02102H03H9/02015H03H9/0504H03H9/1035
Inventor 不公告发明人
Owner HANGZHOU SAPPLAND MICROELECTRONICS TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products