Mixed light source generating device for photoetching machine

Abstract

The invention discloses a mixed light source generating device for a photoetching machine. The mixed light source generating device comprises a mounting shaft, a laser source and an LED light source mounting frame, a laser source is mounted at the bottom of the mounting shaft, a bottom ring is arranged at the bottom of the mounting shaft, the outer wall of the bottom ring is movably connected with the bottom end of a movable shaft, an LED light source mounting frame is arranged on the movable shaft, a plurality of LED light sources with different powers are annularly arrayed on the LED light source mounting frame, a mounting ring sleeves the upper part of the movable shaft, and the mounting ring is connected with a movable block through a movable rod; the multiple movable shafts are arranged along the mounting shaft in an annular array mode. A driving air cylinder is arranged at the top of an inner cavity of the mounting shaft, the output end of the driving air cylinder is connected with a movable block, and a plurality of limiting movable blocks are arranged on the movable block in an annular array mode and movably connected with a movable rod; the rotating mechanism is matched with adjustment of the mounting shaft, the movable shaft can be rotated under the condition of multiple angles, and LED light sources meeting different process requirements are obtained through adjustment.

Description

technical field [0001] The invention belongs to the technical field of lithography machines, in particular to a mixed light source generating device for lithography machines. Background technique [0002] The lithography machine is the most critical equipment in the semiconductor industry, which determines the core performance and size of the chip. [0003] Chinese patent CN205210510U discloses a lithography machine light source technical solution, including more than 10 ultraviolet lamp beads evenly distributed on the front of the light source board, the ultraviolet lamp beads are connected to the generator through wires, and the generator adjusts the intensity of the light source. [0004] In the prior art, photolithography machines generally use semiconductor lasers as the exposure light source, but there is a problem of attenuation of the laser, and the existing laser source and other structures are installed in a fixed way, so when it is suitable for different productio...

AI Technical Summary

Problems solved by technology

[0004] In the prior art, photolithography machines generally use semiconductor lasers as the exposure light source, but there is a problem of attenuation of the laser, and the existing laser source and other structures are installed in a fixed way, so when it is suitable for different process production, it needs This is disassembled to meet its production, so the current light source has a problem of low applicability

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