Semiconductor device and manufacturing method thereof
A manufacturing method and semiconductor technology, applied in the direction of semiconductor devices, semiconductor/solid-state device manufacturing, semiconductor/solid-state device components, etc., can solve problems affecting chip performance, chip rejection, and lower production yield, so as to reduce glue overflow Phenomenon, reduce the probability of rejection, improve the effect of production yield
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[0136] Figures 4a to 4f A method for fabricating a conductive structure is shown according to an exemplary embodiment. refer to Figures 4a to 4f As shown, the method includes at least the following steps:
[0137] Step 1: Refer to Figure 4a As shown, at least two layers of conductive material 202' are formed on the substrate 201. Here, the substrate 201 and the conductive material layer 202' are sequentially stacked along the z direction. The cutting area is located between two adjacent conductive material layers 202'.
[0138] Step 2: Refer to Figure 4b As shown, a photosensitive layer 206' is formed covering at least two layers of conductive material 202' and the dicing area. Here, the substrate 201, the conductive material layer 202' and the photosensitive layer 206' are sequentially stacked along the z direction.
[0139] Step 3: Refer to Figure 4c shown, by exposure and development in the z-direction, a Figure 4d The patterned photosensitive ...
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