Unlock instant, AI-driven research and patent intelligence for your innovation.

Optical detection equipment

A technology for optical inspection and equipment, applied in optical testing for flaws/defects, material analysis by optical means, measurement devices, etc., can solve problems such as low efficiency and complex wafer inspection process, to simplify the inspection process and improve defect inspection. The effect of yield and detection efficiency

Pending Publication Date: 2022-07-22
昂坤视觉(北京)科技有限公司
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In view of the above-mentioned situation, it is necessary to provide an optical detection device for the complex detection process and low efficiency of wafers in the prior art for bright field and dark field detection.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Optical detection equipment
  • Optical detection equipment
  • Optical detection equipment

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0033] In order to facilitate understanding of the present invention, the present invention will be described more fully hereinafter with reference to the related drawings. Embodiments of the invention are shown in the accompanying drawings. However, the present invention may be embodied in many different forms and is not limited to the embodiments described herein. Rather, the embodiments are provided so that this disclosure will be thorough and complete.

[0034] It should be noted that when an element is referred to as being "fixed to" another element, it can be directly on the other element or intervening elements may also be present. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present. The terms "vertical," "horizontal," "left," "right," and similar expressions are used herein for illustrative purposes only.

[0035] Unless otherwise defined, all technical ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

An optical detection apparatus includes: an objective lens; a first lens assembly; a second lens assembly; the light splitting assembly is connected to the objective lens, the first lens assembly and the second lens assembly; the bright field illumination assembly is connected to the first lens assembly and used for emitting a bright field light source, and a light beam of the bright field light source passes through the first lens assembly, the light splitting assembly and the objective lens and then is emitted to the to-be-detected object to form a bright field illumination light path; the dark field illumination assembly is used for emitting a dark field light source, and a light beam of the dark field light source is emitted to the to-be-detected object from the outside of the objective lens to form a dark field illumination light path; an image obtained by the objective lens under the dark field light source and an image obtained by the objective lens under the bright field light source are respectively imaged into the second lens assembly and the first lens assembly through the light splitting assembly, and secondary imaging is carried out by the second lens assembly and the first lens assembly. According to the embodiment of the invention, the bright field detection and the dark field detection are simultaneously realized on the same equipment, and the defect detection rate and the detection efficiency of the wafer are improved.

Description

technical field [0001] The invention relates to the technical field of wafer detection, in particular to an optical detection device. Background technique [0002] Wafer refers to the wafer used to make silicon semiconductor circuits, and its starting material is usually silicon. The manufacturing process is as follows: after dissolving high-purity polycrystalline silicon, it is mixed into silicon crystals, and then slowly pulled out to form cylindrical monocrystalline silicon. The silicon ingots are ground, polished, and sliced ​​to form silicon wafers, or wafers. In the process of wafer fabrication, a series of processes such as pulling single crystals, slicing, grinding, polishing, build-up, photolithography, doping, heat treatment and scribing can cause defects on the surface of the wafer. Therefore, in order to prevent defective wafers from flowing into the packaging process, it is necessary to use wafer inspection equipment to identify defects on the wafer surface an...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G01N21/88G01N21/01H01L21/66
CPCG01N21/88G01N21/01H01L22/30
Inventor 李瑞青马铁中李心怡胡文韬
Owner 昂坤视觉(北京)科技有限公司