106 results about "Darkfield illumination" patented technology

A reflected dark field structure includes a bottom plate, a support tube, a light unit, a diffuser structure, and a reflector unit that provides reflected dark field illumination, such that a gem held by the support tube and surrounded by the diffuser structure is illuminated and viewable through an aperture in the reflector unit. A method for imaging and analyzing a gem includes placing the gem onto a support tube where it is illuminated with dark field and reflected dark field illumination, and viewing the gem via an aperture located on a top reflector unit, which provides a top cover for the gem. Furthermore, a method and apparatus for obtaining images of a gem includes a dark field stage, a reflector unit, and an image-acquiring device, such that a gem placed in the dark field stage is illuminated, and such that the reflector unit covers the dark field stage and provides reflected dark field illumination, and such that the image-acquiring device is directed towards an aperture in the reflector unit.

A hand held industrial identification symbol reader projects diffuse illumination onto a region of interest to produce high contrast images of symbols. The diffuse illumination is particularly well suited for producing images of symbols that are marked directly on objects. The diffuse illumination is created through the use of an optically translucent diffuser having a generally tapered shape that distributes diffuse illumination throughout the field of view of the reader. The diffuse illumination can be supplemented with dark field illumination using selectively actuated illumination sources.

A defect inspection apparatus and method includes a darkfield illumination optical system which conducts darkfield illumination upon the surface of a sample with irradiation light having at least one of wavelength band, a darkfield detection optical system which includes a reflecting objective lens for converging the light scattered from the surface of the sample that has been darkfield-illuminated with the irradiation light having the at least one wavelength band, and imaging optics for imaging onto a light-receiving surface of an image sensor the scattered light that the reflecting objective lens has converged, and an image processor which, in accordance with an image signal obtained from the image sensor of the darkfield detection optical system, discriminates defects or defect candidates present on the surface of the sample.

The broadband brightfield / darkfield wafer inspection system provided receives broadband brightfield illumination information via a defect detector, which signals for initiation of darkfield illumination. The defect detector forms a two dimensional histogram of the defect data and a dual mode defect decision algorithm and post processor assess defects. Darkfield radiation is provided by two adjustable height laser beams Vertical angular adjustability is provided by modifying cylindrical lens position to compensate for angular mirror change by translating an adjustable mirror, positioning the illumination spot into the sensor field of view, rotating and subsequently moving the cylindrical lens. A brightfield beamsplitter in the system is removable, and preferably replaced with a blank when performing darkfield illumination. Light level control for the system is provided by a dual polarizer first stage.

The broadband brightfield / darkfield wafer inspection system provided receives broadband brightfield illumination information via a defect detector, which signals for initiation of darkfield illumination. The defect detector forms a two dimensional histogram of the defect data and a dual mode defect decision algorithm and post processor assess defects. Darkfield radiation is provided by two adjustable height laser beams which illuminate the surface of the wafer from approximately 6 to 39 degrees. Each laser is oriented at an azimuth angle 45 degrees from the orientation of the manhattan geometry on the wafer, and 90 degrees in azimuth from one another. Vertical angular adjustability is provided by modifying cylindrical lens position to compensate for angular mirror change by translating an adjustable mirror, positioning the illumination spot into the sensor field of view, rotating and subsequently moving the cylindrical lens. A brightfield beamsplitter in the system is removable, and preferably replaced with a blank when performing darkfield illumination. Light level control for the system is provided by a dual polarizer first stage. Light exiting from the second polarizer passes through a filter which absorbs a portion of the light and comprises the second stage of light control. The beam then passes through a polarizing beamsplitter. The second channel is further reflected and polarized and both beams thereafter illuminate the substrate.

An apparatus for imaging a symbol associated with an object which includes a housing and an imaging module connected to the housing, where the imaging module includes at least one lens for creating an image of the symbol. The imaging module further has a sensor for sensing the image. An electroluminescent light sheet is connected to the housing, and the electroluminescent light sheet provides at least one of dark field illumination and bright field illumination.