Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Multi-anti-counterfeiting method and multi-anti-counterfeiting element based on structural color

An anti-counterfeiting element and structural color technology, applied in the field of anti-counterfeiting, can solve the problems of easy imitation of the anti-counterfeiting method and low encryption degree, and achieve the effects of increasing the difficulty of imitation, improving the encryption degree and high resolution.

Pending Publication Date: 2022-08-02
ZHEJIANG SCI-TECH UNIV
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] One purpose of this application is to provide a multiple anti-counterfeiting method based on structural color to solve the technical problems that the anti-counterfeiting methods in the prior art are easy to be imitated and the degree of encryption is low, while reducing production costs, improving stability and environmental performance

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Multi-anti-counterfeiting method and multi-anti-counterfeiting element based on structural color
  • Multi-anti-counterfeiting method and multi-anti-counterfeiting element based on structural color
  • Multi-anti-counterfeiting method and multi-anti-counterfeiting element based on structural color

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0099] (1) Preparation of colloidal microsphere dispersion: 156 nm monodisperse poly(styrene-methacrylic acid) colloidal microspheres and 240 nm monodisperse porous silica colloidal microspheres were dispersed in deionized water, and then placed in a frequency Disperse in a 120Hz ultrasonic disperser for 10min. The porous silica colloidal microsphere dispersion liquid with a concentration of 3% (by mass fraction) and a poly(styrene-methacrylic acid) colloidal microsphere dispersion liquid with a concentration of 10% (by mass fraction) were prepared respectively. .

[0100] (2) The monodisperse poly(styrene-methacrylic acid) colloidal microsphere dispersion is uniformly spray-printed on the polyester fabric within the design range of the first preset pattern by an ink-jet printer, and the polyester fabric is placed at 60° after the spray-printing. Perform drying treatment in an oven at a temperature of Within the design range of the second preset pattern, after spray printing...

Embodiment 2

[0104] (1) Preparation of colloidal microsphere dispersion: 154 nm monodisperse polystyrene colloidal microspheres and 239 nm monodisperse porous silica colloidal microspheres were dispersed in deionized water, and then placed in an ultrasonic disperser with a frequency of 120 Hz Disperse for 10min. The porous silica colloidal microsphere dispersion liquid with a concentration of 3% (by mass fraction) and a poly(styrene-methacrylic acid) colloidal microsphere dispersion liquid with a concentration of 10% (by mass fraction) were prepared respectively. .

[0105] (2) The monodisperse polystyrene colloidal microsphere dispersion liquid is uniformly spray-printed on the paper within the design range of the first preset pattern by an ink-jet printer, and the paper is placed in an oven at 60°C for drying treatment after spray-printing , forming a first photonic crystal, that is, forming a first preset pattern that is invisible under visible light irradiation; then uniformly spray-p...

Embodiment 3

[0109] (1) Preparation of colloidal microsphere dispersion: 156 nm monodisperse poly(styrene-butyl acrylate-methacrylic acid) colloidal microspheres and 240 nm monodisperse porous silica colloidal microspheres were dispersed in deionized water, Afterwards, it was placed in an ultrasonic disperser with a frequency of 120 Hz to disperse for 10 min. The porous silica colloidal microsphere dispersion liquid with a concentration of 3% (by mass fraction) and a poly(styrene-methacrylic acid) colloidal microsphere dispersion liquid with a concentration of 10% (by mass fraction) were prepared respectively. .

[0110] (2) The monodisperse poly(styrene-butyl acrylate-methacrylic acid) colloidal microsphere dispersion is uniformly spray-printed on the polyester fabric within the design range of the first preset pattern by an ink-jet printer. The fabric is dried in an oven at 60°C to form a first photonic crystal, that is, a first preset pattern that is invisible under visible light irrad...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
particle diameteraaaaaaaaaa
Login to View More

Abstract

The invention discloses a multi-anti-counterfeiting method and a multi-anti-counterfeiting element based on structural colors. The anti-counterfeiting method comprises the steps that a photonic crystal layer is formed on the surface of an object to be subjected to anti-counterfeiting, the photonic crystal layer at least comprises a first preset pattern and a second preset pattern which are invisible under visible light irradiation, and the first preset pattern serves as a first anti-counterfeiting mark and is composed of a first photonic crystal displaying a first reflection wavelength; the second preset pattern is composed of a second photonic crystal displaying a second reflection wavelength, the second preset pattern and the first preset pattern are complementary to each other and jointly serve as a second anti-counterfeiting mark, and the first reflection wavelength and the second reflection wavelength are different from each other; external stimulation is applied to the photonic crystal layer so that the first preset pattern and the second preset pattern can be sequentially converted into a visible state from an invisible state, the first anti-counterfeiting mark and the second anti-counterfeiting mark can be sequentially displayed, and complete encrypted information can be read after integration. According to the invention, multiple anti-counterfeiting is realized, the imitation difficulty is increased, and the encryption degree is improved.

Description

technical field [0001] The present application relates to the technical field of anti-counterfeiting, in particular to a multiple anti-counterfeiting method and multiple anti-counterfeiting elements based on structural colors. Background technique [0002] Anti-counterfeiting technology is widely used in commodities to identify whether products are counterfeit and counterfeit. In the prior art, anti-counterfeiting is mostly carried out by coating the products with pigments, polymer dots, rare earth metals, etc., but there are generally problems such as poor stability, high cost, high long-term toxicity, easy to be imitated, and low encryption reliability. Their practical application in the fields of textile and clothing. [0003] Responsive photonic crystal structure has broad application prospects in the field of anti-counterfeiting due to its advantages of non-fading and environmental protection. However, the existing anti-counterfeiting technology often only has one piec...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B41M3/14B41M5/00
CPCB41M3/14B41M5/0047
Inventor 张耘箫刘国金金梦婷周岚马万彬柳浩李宇城
Owner ZHEJIANG SCI-TECH UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com