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Projection photoetching objective lens with ultraresolution

A technology of super-resolution and projection light, which is applied in the field of super-resolution projection lithography objective lens, can solve the problems of high price, low resolution, complex structure, etc., and achieve the effects of easy production, increased reduction magnification, and reduced cost

Inactive Publication Date: 2005-09-07
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Its defect is that the resolution is low, and high-resolution graphics cannot be produced
Foreign super-resolution projection lithography objectives, such as Nikon and Canon in Japan, Zeiss in Germany, and Tropel in the United States, have numerical apertures greater than or equal to 0.50-0.60, but there are defects such as complex structure, high price, small optical reduction magnification, and difficulty in making ultra-fine masks

Method used

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  • Projection photoetching objective lens with ultraresolution
  • Projection photoetching objective lens with ultraresolution
  • Projection photoetching objective lens with ultraresolution

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Embodiment Construction

[0017] The present invention will be further described below in conjunction with the drawings and embodiments:

[0018] Such as figure 1 Shown: The super-resolution projection lithography objective lens includes a thermostatic jacket 8, an intermediate layer, an inner layer of optical lens elements and a lens frame assembly.

[0019] The thermostatic jacket 9 with precise thermostatic clean circulating water is the outer layer of the super-resolution projection lithography objective lens. The thermostatic jacket 9 is sealed and fitted on the outside of the lens barrel. The thermostatic jacket 9 keeps the lens barrel and the optical lens frame assembly at a constant temperature, and at the same time separates the optical lens element and the space between the elements in the lens barrel from the outside atmosphere.

[0020] The middle layer is the lens barrel, which is formed by connecting the lens barrel 6 and the lens barrel 11 with connectors. The lens barrel 11 has a flange th...

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Abstract

The invention is a sort of filter projective photoetching objective lens with a super resolution ratio, it is made up of outer hermetic thermostat wrap, interface-layer's drawtube, inner lens frame module which isolating fixed optical lens components, and filter module. It has filter axial overlap function, augments focal depth, overcomes deficiency that the photoetching resolution ratio of current projective photoetching objective lens and can't draw graph with high resolution ratio, it has characters of super-high photoetching resolution ratio, big focal depth, large minification of optical system, simple structure and that it reduces manufacturing difficulty and cost of super micro-masking greatly.

Description

Technical field [0001] The invention is a super-resolution projection lithography objective lens, belonging to the technical field of high-resolution projection lithography objective lenses for a projection lithography device. Background technique [0002] The super-resolution projection lithography objective lens is the core component of the projection lithography device and the key equipment for manufacturing large-scale integrated circuits. At present, the highest resolution of domestic projection lithography objective lenses is 0.35-0.5 microns, and the numerical aperture is not very high, and the working wavelength is generally 436 nm and 365 nm. The disadvantage is that the resolution is low, and high resolution graphics cannot be produced. Foreign super-resolution projection lithography objectives, such as Nikon and Canon in Japan, Zeiss in Germany, Tropel in the United States, etc., have a numerical aperture greater than or equal to 0.50-0.60, but ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B13/22
Inventor 陈旭南姚汉民罗先刚康西巧石建平
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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