Unlock instant, AI-driven research and patent intelligence for your innovation.

Modifier for increasing impact resistance of polyvinyl chloride

A technology of impact resistance and polyvinyl chloride, which is applied in the field of modifiers for improving the impact resistance of polyvinyl chloride, can solve problems such as poor impact resistance, and achieve improved toughness, excellent toughening effect, and improved uniform dispersion. Effect

Inactive Publication Date: 2006-07-26
CHINA KINWA HIGH TECH
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] Polyvinyl chloride (PVC) is a kind of engineering plastic with excellent performance, low price and large output. Its disadvantages are poor impact resistance and brittle quality.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0018] Preparation of seed emulsion: In a 1000ml three-necked flask equipped with a stirrer and a reflux condensing device, nitrogen protection was introduced, and the temperature was kept at 60°C. 400g of deionized water, 0.20g of sodium dodecylsulfonate, and 20g of butyl acrylate were added. 0.20g of potassium peroxodisulfate was stirred, and a pre-emulsion consisting of 200g of BA monomer, 60g of deionized water, and 0.9g of SLS emulsifier was added dropwise, and polymerized for 2 hours to obtain a seed emulsion.

[0019] Preparation of pre-emulsion: Weigh 300g of BA monomer, take 30g of deionized water, 0.6g of SLS emulsifier, 0.3g of CHP initiator, 2.0g of triethylene glycol triacrylate, and emulsify with an emulsifier to obtain a pre-emulsion.

[0020] Seed growth: Add 400g deionized water and 0.20g sodium dodecylsulfonate into a three-necked flask, stir, pass nitrogen gas to remove oxygen at 60°C, add 0.40g Diaobaikuai, 10g seed emulsion, and drop pre-emulsion , add 0.2...

Embodiment 2

[0023] Preparation of seed emulsion: In a 1000ml three-necked flask equipped with a stirrer and a reflux condensing device, nitrogen protection was introduced, and the temperature was kept at 60°C. 400g of deionized water, 0.20g of sodium dodecylsulfonate, and 20g of butyl acrylate were added. 0.20g of potassium peroxodisulfate was stirred, and a pre-emulsion consisting of 200g of BA monomer, 60g of deionized water, and 0.9g of SLS emulsifier was added dropwise, and polymerized for 2 hours to obtain a seed emulsion.

[0024] Preparation of pre-emulsion: Weigh 300g of BA monomer, take 45g of deionized water, 1.5g of SLS emulsifier, 3.0g of CHP initiator, 3.0g of allyl acrylate grafting agent, and emulsify with an emulsifier to obtain a pre-emulsion.

[0025] Seed growth: Add 500g deionized water and 0.20g sodium dodecylsulfonate into a three-necked flask, stir, pass nitrogen gas to remove oxygen at 60°C, add 0.40g Diaobai block, 10g seed emulsion, and then add pre-emulsification...

Embodiment 3

[0028] Preparation of seed emulsion: In a 1000ml three-neck flask equipped with a stirrer and a reflux condensing device, nitrogen protection was introduced, the temperature was kept at 80°C, 400g of deionized water, 1.0g of sodium dodecylsulfonate, and 20g of butyl acrylate were added. 0.20g of potassium peroxodisulfate was stirred, and a pre-emulsion consisting of 200g of BA monomer, 60g of deionized water, and 0.9g of SLS emulsifier was added dropwise, and polymerized for 2 hours to obtain a seed emulsion.

[0029] Preparation of pre-emulsion: Weigh 300g of BA monomer, take 30g of deionized water, 1.5g of SLS emulsifier, 0.90g of CHP initiator, 4.5g of triethylene glycol triacrylate, and emulsify with an emulsifier to obtain a pre-emulsion.

[0030] Seed growth: Add 600g deionized water and 0.20g sodium dodecylsulfonate into a three-necked flask, stir, pass nitrogen gas to remove oxygen at 60°C, add 0.40g Diaobai block, 10g seed emulsion, and then drop pre-emulsified soluti...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

An anti-impact modifier for polyvinyl chloride contains core (96-100 wt.%) and surficial plastic phase (0-4 wt.%). Said core is the homopolymer of butyl acrylate (BA) or the copolymer of butyl acrylate and triglycol acrylate. Said surficial plastic phase is the methyl methylacrylate. It can improve the antiimpact strength of PVC by 21 times and its toughness.

Description

technical field [0001] The invention belongs to a modifier for improving the impact resistance of polyvinyl chloride and a preparation method thereof. Background technique [0002] Polyvinyl chloride (PVC) is a kind of engineering plastic with excellent performance, low price and large output. Its disadvantages are poor impact resistance and brittle quality. In order to overcome this shortcoming and expand the commercial use of polyvinyl chloride (PVC), the research on the modification of polyvinyl chloride has been carried out for decades, and remarkable results have been achieved, which truly make polyvinyl chloride a more versatile Engineering plastics have played an important role in industry, construction, civil and other fields. [0003] The modifier for impact modification of polyvinyl chloride is generally based on an elastomer with a low glass transition temperature, and then grafted on the surface layer with good compatibility with the matrix material to form a co...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C08L33/08C08L27/06
Inventor 张会轩吴广峰时海涛杨海东张明耀
Owner CHINA KINWA HIGH TECH