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Method for removing colour light resistance in exposure positioning producing technology

A technology of color photoresist and manufacturing process, which is applied in the field of removing color photoresist in the exposure alignment manufacturing process, and can solve problems such as the inability to remove color photoresist

Inactive Publication Date: 2006-07-26
TPO DISPLAY
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] However, with the alternation of generations, the size of the substrate increases to the fifth generation or above, which exceeds the size of a general photomask (above 1 meter). At this time, the exposure alignment manufacturing process must be performed more than once (usually four times), for example, by repeating and The step and repeat method completes the exposure steps step by step, that is to say, the exposure alignment position may be at any position in the center of the substrate. At this time, it is known that the EBR method can only remove the colored light protruding from the edge of the substrate. Resist part, but cannot remove the color photoresist at any position in the center of the substrate, obviously not applicable

Method used

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  • Method for removing colour light resistance in exposure positioning producing technology
  • Method for removing colour light resistance in exposure positioning producing technology
  • Method for removing colour light resistance in exposure positioning producing technology

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Embodiment Construction

[0018] Figure 2A to Figure 2C It is a schematic diagram showing the method of removing the color photoresist in the exposure alignment manufacturing process by using RCR in the present invention.

[0019] First, see Figure 2A and its inverse Figure 2B , providing a substrate 30, such as a glass substrate, with an aligned mark (aligned mark) 32 thereon, and then coating a color photoresist 34 on the above-mentioned aligned mark 32 by spin coating (spin coating) On the substrate 30, wherein the color photoresist is a photoresist including red, blue, green or black pigments. Next, the characteristic steps of the present invention are carried out, using an inner tube 36 in a double tube to transport a solvent 37 to make it adhere to the color photoresist area to be removed to dissolve the color photoresist, wherein the solvent 37 uses gravity and capillary phenomenon to dissolve the color photoresist. The solvent 37 adheres to the areas where the color photoresist is to be r...

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Abstract

The color photoresist eliminating method in exposure aligning process include the following steps: providing one substrate with aligning mark, forming color photoresist on the substrate, conveying solution with the inner pipe in double pipe to the area of color photoresist to be eliminated to dissolve the color photoresist, and vacuum pumping dissolved color photoresist with the outer pipe in the double pipe to expose the said aligning mark.

Description

technical field [0001] The invention relates to a method for removing color photoresist, in particular to a method for removing color photoresist in an exposure alignment manufacturing process. Background technique [0002] In order to improve the visual effect, thin film transistor liquid crystal display (TFT-LCD) has been moving towards a large screen trend, and the size of its upstream material glass substrate has to change with generations, for example: 300 mm since 1989* 400 mm, 550 mm * 650 mm by 1996, and 1000 mm * 1000 mm developed to the fifth generation and above. [0003] Different from the TFT manufacturing process that uses fully transparent photoresist (positive photoresist), the color filter manufacturing process is a color photoresist, which is a narrow wave for human vision, and the light penetration ability is very weak, so It will cause a decrease in contrast and make alignment difficult. The color filter manufacturing process first coats a color photore...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F9/00G03F7/00G02F1/136H01L21/027
Inventor 郑其铭
Owner TPO DISPLAY