Magnetic substance with maximum complex permeability in quasi-microwave band and method for production of the same
A complex magnetic permeability, material technology, applied in the field of electromagnetic interference magnetic material, can solve the problem of inability to effectively suppress high-frequency noise, etc.
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example 1
[0041] Under the sputtering conditions shown in Table 1, use Figure 2A M-X-Y magnetic composite thin films were formed on a glass plate using the sputtering device shown in .
[0042] Vacuum before sputtering
-6 support
Ar gas
power supply
RF
Target
Fe (diameter 100nm) and Al 2 o 3 Sliced (120 pieces)
(Slice size: 5mm×5mm×2mm)
[0043] The resulting thin film sample 1 was analyzed by fluorescence X-ray spectroscopy and confirmed to be the synthetic Fe72 Al 11 o 17 film. Film sample 1 has a thickness of 2.0 micrometers (μm), a DC resistivity of 530 microohm centimeters (μΩ·cm), an anisotropy field (Hk) of 18 Oe (Oersted), and a saturation magnetization (Ms) of 16,800 gauss.
[0044] The percentage {Ms(M-X-Y) / Ms(M)}×100 of the saturation magnetization of the thin film sample 1 to the saturation magnetization of the metal material M itself was 72.2%.
[0045] To measure the magnetic perm...
example 2
[0046] Similar to example 1 but using 150Al 2 o 3 Thin film sample 2 was formed on a glass plate under sectioning conditions.
[0047] The resulting thin film sample 2 was analyzed by fluorescence X-ray spectroscopy and confirmed to be the composite Fe 44 Al 22 o 34 film. Film sample 2 has a thickness of 1.2 micrometers (μm), a DC resistivity of 2400 microohm centimeters (μΩ·cm), an anisotropy field (Hk) of 120 Oe, and a saturation magnetic field strength (Ms) of 9600 Gauss. Note that film sample 2 has a higher resistivity than film sample 1.
[0048] The percentage {Ms(M-X-Y) / Ms(M)}×100 of the saturation magnetization of the thin film sample 2 to the saturation magnetization of the metal material M itself was 44.5%.
[0049] The μ "-f response of film sample 2 was also obtained in a manner similar to Example 1 and shown in Figure 4 . Note that this peak also has a high value similar to Example 1. However, the frequency point at the peak, or the natural response freq...
example 9
[0078] Under the sputtering conditions shown in Table 12, use Figure 2A M-X-Y magnetic composite thin films were formed on a glass plate using the sputtering device shown in . The film was heat-treated under a magnetic field at a temperature of 300° C. in vacuum for 2 hours to obtain a film sample 9 .
[0079] Vacuum before sputtering
-6 support
Ar gas
power supply
RF
Target
Fe (diameter 100mm) and TiO 2 Slices (150
slice) (Slice size: 5mm×5mm×2mm)
[0080] The properties of Film Sample 9 are shown in Table 13.
[0081] membrane thickness
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