Developing liquid mfg. device and method

A technology for manufacturing devices and developing solutions, which is applied in semiconductor/solid-state device manufacturing, photography, transportation and packaging, etc., and can solve problems such as deterioration of developing solutions, large occupation, and concentration changes

Inactive Publication Date: 2002-10-09
NAGASE & COMPANY +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

As a result, there is a problem that these costs account for a large proportion of the developer cost
[0015] In addition, before the user uses the developer prepared by the supplier, a period corresponding to transportation and storage is required, and there is a problem that the developer deteriorates during this perio

Method used

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  • Developing liquid mfg. device and method
  • Developing liquid mfg. device and method
  • Developing liquid mfg. device and method

Examples

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Embodiment Construction

[0050] Preferred Mode of Carrying Out the Invention

[0051] Next, embodiments of the present invention will be described in detail. In addition, the same reference numerals are attached to the same elements, and overlapping explanations are omitted. And, the positional relationship is based on the positional relationship shown in the drawings unless otherwise specified. Also, the dimensional ratios in the drawings are not limited to the illustrated ones.

[0052] As mentioned above, figure 1 It is a system diagram schematically showing the structure of the first embodiment of the developer solution manufacturing apparatus of the present invention.

[0053] The developer solution manufacturing apparatus 100 includes a developer solution tank 101 storing a developer solution, and a preparation tank 105 connected to a pure water supply system. The original developing solution is stored in the original developing solution tank 101, and the original developing solution is repl...

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PUM

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Abstract

Provided is a developing solution manufacturing device and method, the device comprising: a preparation tank for supplying and stirring a developing stock solution and pure water to prepare an alkali-based developing solution; and a first liquid volume measuring device for measuring the amount of the alkaline-based developing solution in the preparing tank; A first alkali concentration measuring device for measuring the alkali concentration of the alkali-based developer in the preparation tank; adjusting the amount of the alkali-based developer in the preparation tank based on the measured values ​​of the first liquid volume measuring device and the first alkali concentration measuring device a first liquid volume control device; and adjusting at least one of the supply volume of the developing stock solution and the supply volume of pure water supplied to the preparation tank based on the measured values ​​of the first liquid volume measurement device and the first alkali concentration measurement device liquid supply control device.

Description

technical field [0001] The present invention relates to a developing solution manufacturing device and a developing solution producing method, in particular, to a device for developing a photoresist, etc., connected to a processing facility through a pipeline to which an electronic circuit for fine processing is formed, and developing a photoresist etc. in the processing facility. A manufacturing device for an alkali-based developer and a method for manufacturing the alkali-based developer. Background technique [0002] Generally, in the manufacture of devices having finely processed electronic circuits such as electronic devices, the photoresist materials used in the photolithography process include a positive type that is soluble by exposure and a negative type that is insoluble by exposure. There are two types. As an example, in the manufacture of semiconductor devices, flat panel display (FPD) substrates, etc., since such a photolithography process is repeated, positive...

Claims

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Application Information

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IPC IPC(8): G03F7/26G03D3/00
CPCG03D3/00Y10T137/0329G03F7/26
Inventor 中川俊元菊川诚小川修森田悟宝山隆博
Owner NAGASE & COMPANY
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