Semiconductor memory device with static memory cells
A technology of storage unit and memory, which is applied in static memory, semiconductor devices, semiconductor/solid-state device manufacturing, etc. It can solve the problems of storage node decline, inability to cope, and increase in power consumption, and achieve low power consumption.
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Embodiment 1
[0034] figure 1 It is an overall block diagram conceptually showing the structure of the semiconductor memory of the present invention.
[0035] refer to figure 1 The semiconductor memory 10 includes a row address terminal 12 , a column address terminal 14 , a control signal terminal 16 , a data input / output terminal 18 , and a power supply terminal 20 . Furthermore, the semiconductor memory 10 includes a row address buffer 22 , a column address buffer 24 , a control signal buffer 26 , and an input / output buffer 28 . Furthermore, the semiconductor memory 10 includes a row address decoder 30 , a column address decoder 32 , a sense amplifier / write driver 34 , a multiplexer 35 , a memory cell array 36 and an internal power generation circuit 38 .
[0036] Row address terminal 12 and column address terminal 14 respectively receive row address signals X0 to Xm and column address signals Y0 to Yn (m and n are natural numbers). The control signal terminal 16 receives a write contr...
Embodiment 2
[0134] In Embodiment 2, in the memory cell in Embodiment 1 or its modification, a capacitor is provided on the storage node. Therefore, the capacitance of the storage node is increased to improve the performance against soft errors. As a result, the operation of the memory cell becomes stable.
[0135] Since the overall structure of the semiconductor memory of Embodiment 2 is the same as figure 1 The structure of the semiconductor memory 10 shown in FIG. 2 is the same, so its description will not be repeated.
[0136] Figure 11 is a circuit diagram showing the structure of the memory cell in the second embodiment.
[0137] refer to Figure 11The memory cell 100A further includes capacitors 128 and 130 and a constant potential node 132 in addition to the structure of the memory cell 100 in the first embodiment. Capacitor 128 is connected between storage node 114 and constant potential node 132 . Capacitor 130 is connected between storage node 116 and constant potential n...
Embodiment 3
[0141] In Embodiment 3, in the memory cell of Embodiment 1 or its modification, a resistance element made of polysilicon and having a high resistance value constitutes a load element.
[0142] Because the overall structure of the semiconductor memory of embodiment 3 and figure 1 The structure of the semiconductor memory shown in is the same, so its description will not be repeated.
[0143] Figure 12 is a circuit diagram showing the structure of the memory cell in the third embodiment.
[0144] refer to Figure 12 In the structure of the memory cell 100 in the first embodiment, the memory cell 100B includes high-resistance elements 134 and 136 made of polysilicon instead of the P-channel TFTs 110 and 112 . The other circuit structures of the memory cell 100B are the same as those of the memory cell 100 .
[0145] The high-resistance elements 134 and 136 made of polysilicon are also formed by laminating a polysilicon film via an interlayer insulating film on top of buried ...
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