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Semiconductor memory device with static memory cells

A technology of storage unit and memory, which is applied in static memory, semiconductor devices, semiconductor/solid-state device manufacturing, etc. It can solve the problems of storage node decline, inability to cope, and increase in power consumption, and achieve low power consumption.

Inactive Publication Date: 2004-12-01
RENESAS TECH CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0010] However, if the reduction in voltage continues to progress, even the above-mentioned conventional CMOS memory cells cannot cope with it.
That is, this is because, in this CMOS memory cell, the potential of the storage node is further lowered than the power supply potential, which is a low potential, due to the threshold voltage of the access transistor constituted by an N-channel MOS transistor. cannot turn on the drive transistor
[0011] Here, lowering the threshold voltage of the N-channel MOS transistor is also considered, but the lowering of the threshold voltage leads to an increase in leakage current, which in turn increases power consumption

Method used

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  • Semiconductor memory device with static memory cells
  • Semiconductor memory device with static memory cells
  • Semiconductor memory device with static memory cells

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0034] figure 1 It is an overall block diagram conceptually showing the structure of the semiconductor memory of the present invention.

[0035] refer to figure 1 The semiconductor memory 10 includes a row address terminal 12 , a column address terminal 14 , a control signal terminal 16 , a data input / output terminal 18 , and a power supply terminal 20 . Furthermore, the semiconductor memory 10 includes a row address buffer 22 , a column address buffer 24 , a control signal buffer 26 , and an input / output buffer 28 . Furthermore, the semiconductor memory 10 includes a row address decoder 30 , a column address decoder 32 , a sense amplifier / write driver 34 , a multiplexer 35 , a memory cell array 36 and an internal power generation circuit 38 .

[0036] Row address terminal 12 and column address terminal 14 respectively receive row address signals X0 to Xm and column address signals Y0 to Yn (m and n are natural numbers). The control signal terminal 16 receives a write contr...

Embodiment 2

[0134] In Embodiment 2, in the memory cell in Embodiment 1 or its modification, a capacitor is provided on the storage node. Therefore, the capacitance of the storage node is increased to improve the performance against soft errors. As a result, the operation of the memory cell becomes stable.

[0135] Since the overall structure of the semiconductor memory of Embodiment 2 is the same as figure 1 The structure of the semiconductor memory 10 shown in FIG. 2 is the same, so its description will not be repeated.

[0136] Figure 11 is a circuit diagram showing the structure of the memory cell in the second embodiment.

[0137] refer to Figure 11The memory cell 100A further includes capacitors 128 and 130 and a constant potential node 132 in addition to the structure of the memory cell 100 in the first embodiment. Capacitor 128 is connected between storage node 114 and constant potential node 132 . Capacitor 130 is connected between storage node 116 and constant potential n...

Embodiment 3

[0141] In Embodiment 3, in the memory cell of Embodiment 1 or its modification, a resistance element made of polysilicon and having a high resistance value constitutes a load element.

[0142] Because the overall structure of the semiconductor memory of embodiment 3 and figure 1 The structure of the semiconductor memory shown in is the same, so its description will not be repeated.

[0143] Figure 12 is a circuit diagram showing the structure of the memory cell in the third embodiment.

[0144] refer to Figure 12 In the structure of the memory cell 100 in the first embodiment, the memory cell 100B includes high-resistance elements 134 and 136 made of polysilicon instead of the P-channel TFTs 110 and 112 . The other circuit structures of the memory cell 100B are the same as those of the memory cell 100 .

[0145] The high-resistance elements 134 and 136 made of polysilicon are also formed by laminating a polysilicon film via an interlayer insulating film on top of buried ...

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Abstract

A semiconductor memory device, comprises memory cell storing data; and word line and pair of bit lines connected to memory cell. The memory cell includes first inverter including first load element and first driving element having N channel metal oxide semiconductor (MOS) transistor; and second inverter cross-coupled with first inverter, including a second load element and a second driving element having another N channel MOS transistor. - A semiconductor memory device, comprises a memory cell storing data; and a word line and a pair of bit lines connected to the memory cell. The memory cell includes: - (1) a first inverter including a first load element and a first driving element having an N channel metal oxide semiconductor (MOS) transistor; - (2) a second inverter cross-coupled with the first inverter, including a second load element and a second driving element having another N channel MOS transistor; - (3) first and second storage nodes connected respectively to output nodes of the first and second inverters; - (4) first and second gate elements each including a P channel MOS transistor having a gate electrode (218, 220) connected to the word line, connecting the first and second storage nodes to one bit line and the other bit line of the pair of bit lines, respectively; - (5) a first metal interconnection (276) forming the first storage node and provided stacked on the first driving element and the first gate element formed on a substrate surface; and - (6) a second metal interconnection forming the second storage node and provided stacked on the second driving element and the second gate element formed on the substrate surface. - The first and second load elements are provided above the first and second metal interconnections.

Description

technical field [0001] The present invention relates to a semiconductor memory, and more particularly, to a semiconductor memory including a static memory cell. Background technique [0002] SRAM (Static Random Access Memory), which is a typical type of semiconductor memory, is a RAM that does not require a refresh operation to hold stored data. The memory cell of the SRAM has a structure in which a flip-flop that cross-connects two inverters consisting of a load element and a drive transistor is connected to a pair of bit lines via an access transistor. [0003] As a typical memory cell in SRAM, a CMOS type memory cell in which a P-channel MOS transistor constitutes a load element and an N-channel MOS transistor constitutes a drive transistor and an access transistor is generally known. This CMOS type memory cell has low power consumption, and in terms of CMOS characteristics, it has excellent static noise margin (hereinafter, also referred to as "SNM") characteristics, an...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G11C11/34G11C11/412G11C11/417H10B10/00H10B12/00
CPCY10S257/904Y10S257/903H01L27/1104H01L27/1112G11C11/412H01L27/11H10B10/15H10B10/00H10B10/12
Inventor 芦田基
Owner RENESAS TECH CORP