Methods of forming non-volatile resistance variable devices and methods of forming silver selenide comprising structures
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- MICRON TECH INC
- Publication Date
- 2005-07-27
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
technical field
[0001] The present invention relates to methods of forming nonvolatile variable resistance devices and methods of forming structures comprising silver selenide. Background technique
[0002] Semiconductor manufacturing continues efforts to make individual electronic devices smaller and smaller, resulting in denser integrated circuits. One class of integrated circuits includes memory circuits in which information is stored in the form of binary data. Circuitry can be fabricated such that data is either volatile or non-volatile. Volatile memory causes data loss when power is interrupted. Non-volatile memory circuits retain stored data even when power is interrupted.
[0003] The present invention is primarily an improvement over the design and operation of memory circuits disclosed in U.S. Patent Nos. 5,761,115, 5,896,312, 5,914,893, and 6,084,796 to Kozicki et al., ultimately derived from U.S. Patent Application Serial No. filed on May 30, 1996 08 / 652,706 ...