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Multi-image reticles

A technology of reticles and lanes, applied in optics, instruments, optomechanical equipment, etc., can solve the problem of expensive reticles

Inactive Publication Date: 2005-10-19
SYST ON SILICON MFG PTE
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

If you want to produce a brand new set of 30 reticles, it usually costs about US$350,000
So it's very expensive to produce a set of original reticles, if not all of them are faulty, the various reticles are not redesigned and reproduced until the blueprints for the job run out

Method used

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  • Multi-image reticles
  • Multi-image reticles
  • Multi-image reticles

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0038] image 3 A reticle according to an embodiment of the invention is shown. This example is compatible with figure 1 The prior art shown has many of the same technical features, the obvious difference is that the 6 patterns shown are all different, and they are for different layers of the same circuit.

[0039] exist image 3 In the reticle 100 is a glass plate coated with a chrome layer 102 . A barcode 104 is used for automatic identification, while an identifier 106 is written for manual identification. Positioning marks 108 enable accurate positioning of the reticle during use.

[0040] The reticle has 6 distinct image areas 110-120, each image area contains an image pattern for a different layer, and they are used at different times. In this example, image area 110 includes the wire layer 1 pattern, image area 112 includes the wire layer 2 pattern, image area 114 includes the wire layer 4 pattern, image area 116 includes the wire layer 3 pattern, image area 118 in...

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Abstract

A reticle 100 includes two or more image patterns for different layers of an integrated circuit, each one in a separate image field 110 - 120. These image layers are used in the production of the same integrated circuit. By placing multiple image layers on the same reticle, fewer reticles need to be produced and a prototype circuit can then be made more cheaply. Likewise the reduced set of reticles can be used where there is a limited run of circuits. If any or all reticle layers need to be replaced, then the replacement set is also cheaper.

Description

technical field [0001] This application relates to reticles and the production of reticles for photolithography. In particular, it relates to such reticles for masters and the production of reticles. Background technique [0002] Photolithography involves replicating patterns in a photosensitive photoresist coating on a substrate, usually a semiconductor substrate. Different areas of the coating are irradiated according to the pattern in the reticle or mask. The irradiated areas are then dissolved in a solvent during further processing; only the non-irradiated areas of the coating remain. Integrated circuits are fabricated by repeating this process multiple times with different patterns. In this way, the processing of typical integrated circuits can be increased to up to thirty different patterns. As the complexity of the circuit increases, it is also possible to increase the number of patterns. [0003] generally known figure 1 The reticle in 10. The reticle is a chr...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F1/08G03F1/14G03F1/50G03F7/20H01L21/027
CPCG03F1/14G03F7/70433G03F1/50G03F1/42G03F1/62
Inventor E·布歇S·科博C·Y·L·王
Owner SYST ON SILICON MFG PTE