Supercharge Your Innovation With Domain-Expert AI Agents!

Ultraviolet cleaner

A cleaning device and ultraviolet technology, applied in cleaning methods and utensils, electrical components, semiconductor/solid-state device manufacturing, etc., can solve the problems of high heating temperature, influence of processing objects, low UV illumination, etc., to achieve high cleaning cleanliness, increase Effects of Illumination and Ozone Concentration

Inactive Publication Date: 2010-04-07
上海国达特殊光源有限公司
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] 1. The illuminance of UV is small, and a large amount of ultraviolet rays cannot be concentrated for surface cleaning
[0005] 2. The concentration of ozone is low, and the super-strong oxidation effect of ozone cannot be fully exerted
[0006] 3. Uneven distribution of ozone, uneven effect on surface cleaning
[0007] 4. High heating temperature will affect the processing object
[0008] 5. The amount of ozone emission is large. After the emission, the adverse effects on the environment of the surrounding personnel should be considered. Sometimes it is even necessary to use activated carbon and other measures to eliminate it.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Ultraviolet cleaner
  • Ultraviolet cleaner
  • Ultraviolet cleaner

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0022] The present invention will be further described below in conjunction with the accompanying drawings and embodiments.

[0023] see figure 1 As shown, the ultraviolet cleaning device of the present invention is used for object surface cleaning and modification, including a reaction chamber 1, a workbench 2 that runs through the reaction chamber 1 for carrying workpieces, and has a plurality of ultraviolet discharge tubes 3 in the reaction chamber 1. 3 can simultaneously emit ultraviolet rays with wavelengths of 253.7 and 184.9NM, and their photon energies are 472KJ / mol and 647KJ / mol respectively, which can cut off most molecular bonds. The above-mentioned workbench 2 is a conveyor belt, which is driven by two runners. After the workpiece is placed on the workbench 2, the work enters the reaction chamber 1 due to the movement of the conveyor belt. In order to facilitate the entry and exit of the conveyor belt, openings are provided on both sides of the reaction chamber 1 ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The ultraviolet cleaner is used in surface cleaning and modification of body. It includes reactor with air outlet connected to air pipe for leading air out of the reactor and air inlet for leading airinto the chamber after cooling, work bench inside the reactor for bearing body, one or several ultraviolet discharge tubes inside the reactor to emit ultraviolet ray of wavelength shorter than 280 nm.The present invention has increased ozone concentration and lowered reactor temperature and can clean the surface of body and improve the surface contact performance effectively.

Description

technical field [0001] The present invention relates to an ultraviolet cleaning device, in particular to an ultraviolet cleaning device which utilizes ultraviolet rays and ozone generated by ultraviolet rays to irradiate air for cleaning. Background technique [0002] Generally, in the manufacture of semiconductor devices, liquid crystal display elements, and optical products that need to increase the yield, the surface needs to be cleaned to remove stains on the surface of the workpiece and improve the adhesiveness and adhesion of the surface. The traditional technology uses wet cleaning, and the chemical solution is applied to the working surface to make it react with the stains on the working surface. Under such a traditional process, the residue of the chemical solution on the working surface needs to be cleaned after the reaction. During the cleaning process, new pollution will be generated. On this basis, the treatment technology of dry surface is produced. In recent...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): B08B7/00H01L21/302
Inventor 王国征
Owner 上海国达特殊光源有限公司
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More