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Image sensor having self-aligned and overlapped photodiode and method of making same

一种光电二极管、自对准的技术,应用在图像传感器领域,能够解决图像延迟等问题

Inactive Publication Date: 2006-01-25
SAMSUNG ELECTRONICS CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The E2 group of charges remaining in the photodiode region causes the image delay phenomenon

Method used

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  • Image sensor having self-aligned and overlapped photodiode and method of making same
  • Image sensor having self-aligned and overlapped photodiode and method of making same
  • Image sensor having self-aligned and overlapped photodiode and method of making same

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Experimental program
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Embodiment Construction

[0031] image 3 is a schematic diagram of a pixel portion of a four-layer type CMOS image sensor (CIS) applicable to the present invention. refer to image 3 , the active pixel PX1 of the CMOS image sensor includes a photodiode PD that captures incident light and converts the light into charges. The transfer transistor TX transfers charges generated by the photodiode PD from the photodiode PD to the floating diffusion region N1 in response to a control signal of the transfer activation line TL. The reset transistor RX resets the charge accumulated in the floating diffusion region N1 to a reference level in response to a control signal of the reset line RL. The drive transistor DX used in a source follower (amplifier) ​​configuration buffers the voltage at N1 to the output V OUT . Select transistor SX is used to select an active pixel in response to a control signal on line WL.

[0032] Figure 4 is a schematic diagram of a pixel portion of a five-layer type CMOS image se...

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PUM

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Abstract

An image sensing device includes a gate dielectric layer formed on a substrate and a transfer gate formed on the gate dielectric layer. A masking layer is formed on the transfer gate, the masking layer having a width smaller than a width of the transfer gate, such that a portion of the transfer gate protrudes laterally from under the masking layer. A photodiode is formed in the substrate to be self-aligned with the masking layer and to extending laterally under the transfer gate, that is, to overlap the transfer gate. Because of the overlap of the photodiode with the transfer gate, offset between the photodiode and the transfer gate is eliminated, such that an image lag phenomenon is eliminated.

Description

technical field [0001] The present invention relates to image sensors. Background technique [0002] An image sensor is a device that receives a light signal from an object and converts the light signal into an electrical signal. The electrical signal may then be transmitted for further processing, eg digitization, and subsequently stored in a storage device such as a memory or an optical or magnetic disk, or for display on a display, printing, etc. Image sensors are commonly used in devices such as digital still cameras, video cameras, printers, facsimile machines, and the like. [0003] There are generally two types of image sensors, namely, charge-coupled device (CCD) sensors and CMOS image sensors (CIS). CCD sensors generally have advantages including low noise operation and device uniformity. CIS devices are generally characterized by low power consumption and can operate at high speeds due to high frame rate capabilities. [0004] figure 1 is a schematic cross-sec...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L27/146H04N5/335
CPCH01L27/14603H01L27/14643H01L27/14689H01L27/14609H01L27/146H01L31/10
Inventor 朴永薰
Owner SAMSUNG ELECTRONICS CO LTD