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Alignment system, vertical tray transporting assembly, and deposition apparatus with the same

A technology of correction system and transfer device, which is applied in the field of correction system, vertical disk transfer device and evaporation device with this device, which can solve the problem of difficulty in applying large-area substrates, inability to obtain film thickness, and difficulty in evaporating precise patterns. and other issues to achieve the effect of minimizing the impact, ensuring the correction position, and correct correction effect

Active Publication Date: 2006-06-21
SAMSUNG DISPLAY CO LTD
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AI Technical Summary

Problems solved by technology

The up-rotary film deposition method is a method in which a thin film is deposited while rotating the substrate relative to the deposition source. This method is difficult to apply to large-area substrates.
The upward evaporation method is to arrange the evaporation source on the lower part of the substrate, and make the substrate or the evaporation source move horizontally while evaporating the thin film. Since this method causes the sagging phenomenon of the substrate or mask, it is not only difficult to evaporate Precise patterns are plated, and uniform film thickness cannot be obtained
[0016] and, Figure 1a and Figure 1b The downward evaporation method shown is a method of evaporating a thin film by spraying organic matter downward while moving the substrate horizontally. Although this method has a high evaporation efficiency of the evaporation material, the surface of the evaporated film may be directly exposed to fine particles

Method used

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  • Alignment system, vertical tray transporting assembly, and deposition apparatus with the same
  • Alignment system, vertical tray transporting assembly, and deposition apparatus with the same
  • Alignment system, vertical tray transporting assembly, and deposition apparatus with the same

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Embodiment Construction

[0078] Hereinafter, the calibration system provided by the present invention will be described in detail with reference to the accompanying drawings.

[0079] figure 2 To represent a schematic diagram of the correction system provided according to the preferred embodiment of the present invention, image 3 and Figure 4 to represent figure 2 Parts of the correction system shown are separate and combined side views, Figure 5a and Figure 5b to represent figure 2 The shown coupling part is pulled out and enlarged schematic diagram and the rear view of the coupling hole.

[0080] According to the correction system provided by the present invention such as figure 2 As shown, the mask (mask) disk 300 and the substrate disk 100 are simultaneously fixed to the disk holder 500 by the coupling portion while the distance between the substrate disk 100 and the support plate 590 of the disk holder 500 is controlled by zoom out. And, the alignment system maintains the fixed po...

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Abstract

The present invention relates to a tandem thin film evaporation system. It provides a calibration system, vertical type, which realizes vertical evaporation by fixing and supporting substrates, minimizes the influence of fine particles during transfer, and can fully ensure the flatness of a mask. A disk transfer device and a vapor deposition device having the same. The solution of the present invention comprises: a substrate disk (100) for vertically fixing the substrate (10); a mask disk (300) for vertically fixing the mask plate (30) in order to align with the substrate disk (100) ; a disc holder (500) coupling the substrate disc (100) and the mask disc (300) via a coupling portion.

Description

technical field [0001] The present invention relates to a calibration system, a vertical disk transfer device and an evaporation device with the device, in particular to a thin film evaporation system in a tandem form to realize vertical evaporation by fixing and supporting the substrate, and to make A correction system for sufficiently securing the flatness of a mask plate while minimizing the influence of fine particles during transfer, a vertical type disk transfer device, and a vapor deposition device equipped with the device. Background technique [0002] In general, the thin film vapor deposition process is roughly classified into a method of vapor deposition in vacuum and a method of vapor deposition in atmospheric pressure. [0003] Among the methods, the method of evaporating a thin film in a vacuum can form a high-purity thin film without intervening impurities, and can vapor-deposit a thin film with a relatively dense density, so it is wi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/50C23C14/54
CPCG03F7/70733G03F7/09H10K71/191H10K71/164H10K71/166H10K71/00
Inventor 韩尚辰宋官燮郑锡宪康熙哲
Owner SAMSUNG DISPLAY CO LTD
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