Process for preparing Moire photon

A photonic crystal and polystyrene technology, applied in optics, optical components, nonlinear optics, etc., can solve problems such as the simplification of photonic crystal structure, and achieve the effects of enriching structural changes, improving development and preparation efficiency, and reducing preparation costs.

Inactive Publication Date: 2006-07-12
SOUTHEAST UNIV
View PDF0 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Technical problem: The purpose of the present invention is to provide a preparation method of moiré photonic crystals, through which we can easily obtain photonic crystals with various new structures, thereby solving the pro

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Process for preparing Moire photon
  • Process for preparing Moire photon
  • Process for preparing Moire photon

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0022] The key to realizing the preparation of Moiré photonic crystals is to overlap two simple photonic crystals with the same structure according to a certain deflection angle. Simple photonic crystals can be obtained by self-assembly methods. By means of micro-processing, Moiré photonic crystals can be obtained directly. Combining self-assembly and microfabrication methods, here are three methods for preparing moiré photonic crystals: preparation of moiré photonic crystals with opal structure, preparation of moiré photonic crystals with inverse opal structure, and preparation of moiré photonic crystals using micromachining technology Methods.

[0023] 1. Preparation of moiré photonic crystal with opal structure:

[0024] The photonic crystal of opal structure refers to the hexagonal close-packed structure of dielectric nano (micro) particles arranged on the substrate. The preparation process of moiré photonic crystal with opal structure is as follows: figure 2 shown. ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The preparation method for Mohr photon crystal comprises: rotating two photon crystals with same periodic structure for some angle to overlap and form the Mohr photon crystal; exactly, using crystal of opal structure opposite to polystyrene or PMMA or silicon dioxide to self-assemble and ordered array into ball of nano or micron level, or using crystal of anti-opal structure opposite to powder dielectric material, or using microtechnique opposite to membrane dielectric material. This invention has variable structure forms to cut cost and improve development and preparation efficiency.

Description

technical field [0001] The invention relates to a preparation method for a novel structured photonic crystal, which belongs to the technical field of photonic crystal preparation. Background technique [0002] Photonic crystals are a class of advanced photonic materials, which are composed of two different dielectric materials arranged in a certain period in space. Similar to the forbidden band in semiconductors, there is also a forbidden band relative to light propagation in photonic crystals, so it can realize functions such as manipulation and modulation of light. Photonic crystals can be used to construct low-threshold lasers and straight (sharp) angle photoconductive devices that cannot be realized by ordinary methods. At the same time, photonic crystals are also the main components of devices in the next generation of photonic computers. Therefore, the international community attaches great importance to the development of such materials. In further research, with the...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): G02F1/01G02B1/00
Inventor 顾忠泽韩水昊陈海华
Owner SOUTHEAST UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products