Light emitting screen structure and image forming apparatus
A technology of light-emitting screens and light-emitting elements, applied in image/graphic display tubes, discharge tubes, screen tubes, etc., can solve problems such as uneven brightness, device damage, and insufficient solutions.
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example 1
[0062] have as Figure 1A and 1BA light-emitting substrate of the configuration shown was prepared in the following procedure.
[0063] On a glass substrate 1, an ITO film was formed on the entire upper surface, and a grid-shaped pattern was formed by lithographic printing processing, so that a resistor element 4 was obtained. Then, a patterned NiO film was formed as the connection resistor 3 . Then, the common electrode 2 is formed with Ag paste so as to be in contact with all the connection resistors 3 . Then, NP-7803 (manufactured by Noritake Kizai Co., Ltd.) was printed as a black element 6 on the patterned ITO film, followed by coating and baking of red, green and blue phosphors 5 . Finally, an island-shaped metal backplane 7 is formed on the phosphor 5 by vacuum evaporation.
[0064] In this example, a glass substrate PD200 manufactured by Asahi Glass Co., Ltd. with a thickness of 2.8 mm was used. In addition, in the matrix-shaped resistor element 4, the width of th...
example 2
[0072] preparation Figure 3A and 3B The light-emitting substrate in the configuration shown. This example is similar to Example 1, except that three red, green and blue phosphors 5 arranged continuously along the X direction are covered by a single metal back plate 7 together.
[0073] In this example, the width of the Y-direction strip portion extending in the Y-direction of the ITO resistor is 100 μm, and the thickness is 100 nm, and the sheet resistance of the ITO film is adjusted to 30 kΩ / square, so that the adjacent metal in the Y-direction A resistance of about 120 kΩ is obtained between the backplanes 7 . In addition, the width of the ITO film extending in the X direction was 50 μm, so that a resistance (individual resistance) of about 800 kΩ was obtained between adjacent metal back plates in the X direction. In addition, the intersecting portion of the grid pattern of the resistance element 4 has a radius of curvature of 50 μm, matching the narrow strip width in th...
example 3
[0080] preparation Figure 4A and 4B The light-emitting substrate in the configuration shown. This example is similar to Example 1, except that the resistor elements 4 are located below the black elements 6, and two Y-direction strip portions of the resistor elements 4 are provided for each metal backplane along the Y-direction.
[0081] In this example, the width of the ITO resistor and the strip portion in the Y direction is 50 μm, and the sheet resistance of the ITO film is adjusted to 30 kΩ / square, thereby obtaining a resistance of about 120 kΩ between adjacent metal backplanes 7 in the Y direction. resistance. In addition, the width of the X-direction stripe portion of the ITO film was 30 μm, thereby obtaining a resistance (individual resistance) of about 800 kΩ between adjacent metal back plates in the X direction. In addition, the intersecting portion of the grid pattern of the resistance element 4 has a radius of curvature of 50 μm, matching the narrow strip width i...
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