Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Fine seam type coating device

A coating device and slit technology, which is applied in the direction of devices and coatings for coating liquid on the surface, to achieve the effect of increasing the adjustable range, improving the swelling phenomenon and increasing the stability

Inactive Publication Date: 2006-08-30
ALLIED MATERIAL TECH CORP
View PDF0 Cites 6 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Slit applicator nozzle located above the base

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Fine seam type coating device
  • Fine seam type coating device
  • Fine seam type coating device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0021] In order to solve the swelling phenomenon when the coating material is extruded out of the nozzle in the slit coating method, the invention provides a slit coating device. In the coating device, a membrane is arranged on the slit coating nozzle so that the membrane extends outward from the slit coating nozzle, and the width of the membrane covers the discharge range of the slit coating nozzle. When the coating material is extruded out of the nozzle, it will be coated on the substrate along the membrane, thus improving the expansion phenomenon of the coating material and increasing the stability of the coating film.

[0022] Such as Figure 2A Shown is a side view of a slot coating device according to a preferred embodiment of the present invention. In this preferred embodiment, a membrane 206 is disposed on the nozzle 204 of a slit coating device. The diaphragm extends outward from the slit opening 204a. When performing slit coating, the nozzle 204 and the base 210 m...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The present invention relates to an improved fine-slot type coating equipment. It includes base seat, fine-slot type coating nozzle and diaphragm. The fine-slot type coating nozzle is positioned on the base seat, the diaphragm is fixed on the fine-slot type coating nozzle, and said diaphragm is outwards extended from the fine-slot type coating nozzle, and the width of said diaphragm can cover the spraying range of said fine-slot type coating nozzle. When the fine-slot type coating nozzle and base seat are sued for driving coating material and making it be moved onto base material by means of their relative movement, the diaphragm can raise stability of coating process.

Description

technical field [0001] The invention relates to a slit coating device, in particular to an extrusion-type slit coating device. Background technique [0002] The continuous improvement of liquid crystal display manufacturing technology, especially the progress of large-scale liquid crystal display manufacturing technology, has made vacuum tube displays replaced by liquid crystal displays in many application fields. Related products of liquid crystal displays have also become popular products in recent years. [0003] In the manufacturing process of liquid crystal displays, lithography is one of a series of important processes. The photolithography process patternes the film layer in the liquid crystal display through steps such as coating photoresist, developing, and exposing. On the fourth-generation panel, the photoresist is generally coated by spin coating. Starting from the fifth generation panel, due to the size of the panel is too large, the slit coating method is ge...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B05C5/02B05C11/00
Inventor 刘昱庭柯山文谢秉原陈重廷顾鸿寿
Owner ALLIED MATERIAL TECH CORP
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com