Method of making MoO2 powders, products made from MoO2 powders, deposition of MoO2 thin films, and methods of using such materials

Abstract

The invention relates to high purity MoO2 powder by reduction of ammonium molybdate or molybdenum trioxide using hydrogen as the reducing agent in a rotary or boat furnace. Consolidation of the powder by press / sintering, hot pressing, and / or HIP is used to make discs, slabs, or plates, which are used as sputtering targets. The MoO2 disc, slab, or plate form is sputtered on a substrate using a suitable sputtering method or other physical means to provide a thin film having a desired film thickness. The thin films have properties such as electrical, optical, surface roughness, and uniformity comparable or superior to those of indium-tin oxide (ITO) and zinc-doped ITO in terms of transparency, conductivity, work function, uniformity, and surface roughness. The MoO2 and MoO2 containing thin films can be used in organic light-emitting diodes (OLED), liquid crystal display (LCD), plasma display panel (PDP), field emission display (FED), thin film solar cell, low resistivity ohmic contacts, and other electronic and semiconductor devices.

Description

Background technique [0001] The invention relates to the preparation of high-purity MoO 2 method, especially involving MoO with a density close to the theoretical 2 boards, products containing such boards. [0002] Indium tin oxide (ITO) and zinc-doped ITO and aluminum-doped ZnO are commonly used sputtering target materials, but their work functions (typically around 4.7eV) are not as expected when used in applications such as OLEDs. The light emission function of the is well matched. [0003] It would be desirable to provide a sputtering target material that can be used to fabricate organic light emitting diodes that does not have the problems and limitations of ITO and zinc-doped ITO sputtering target materials. Contents of the invention [0004] The present invention relates to high-purity MoO obtained by reducing ammonium molybdate or molybdenum trioxide in a rotary or boat-shaped furnace by using hydrogen as a reducing agent 2 powder. Powder consolidation by pressi...

AI Technical Summary

Problems solved by technology

[0002] Indium tin oxide (ITO) and zinc-doped ITO and aluminum-doped ZnO are commonly used sputtering target materials, but their work functions (typically around 4.7eV) are not as expected when used in applications such as OLEDs. The light emission function of the well-matched