System and method for supplying functional water
A technology for supplying system and functional water, which is applied in the field of devices for manufacturing substrates, and can solve problems such as waste of functional water and treatment failure
Active Publication Date: 2006-09-20
SEMES CO LTD
View PDF0 Cites 4 Cited by
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Therefore, since the functional water supply system in the prior art discharges the functional water to the outside until the gas concentration dissolved in the functional water reaches a set concentration range, the system causes a large waste of functional water
In addition, because the gas concentration is measured at a location near the functional water generator 12, the measured concentration may be higher than the actual gas concentration due to residual gas that is not completely dissolved, thereby causing process failure
Method used
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View moreImage
Smart Image Click on the blue labels to locate them in the text.
Smart ImageViewing Examples
Examples
Experimental program
Comparison scheme
Effect test
Embodiment Construction
[0025] The present invention will now be described more fully with reference to the accompanying drawings, in which exemplary embodiments of the invention are shown. However, this invention may be embodied in different forms and should not be construed as limited to the embodiments set forth herein; rather, these embodiments are provided so that this disclosure will be thorough and complete, and will enable those skilled in the art to fully Understand the principles of the invention. In the drawings, the shapes of components are exaggerated for clarity.
[0026] figure 2 is a view schematically showing a functional water supply system 10 according to an embodiment of the present invention. refer to figure 2 , in the functional water supply system 10, functional water is supplied to one or more treatment units 900, and the treatment units 900 use the functional water for treatment. For example, the processing unit 900 may be an apparatus for cleaning wafers or substrates us...
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More PUM
Login to View More Abstract
A supply system for supplying a functional water to a process unit which treats a substrate using the functional water is provided. In the system, the functional water generated in the functional water generator is supplied to a distributor through a functional water supply pipe. Thereafter, the functional water is supplied to the process unit while the process unit performs a process, and the functional water is returned to the functional water generator through a functional water returning pipe while the process unit does not perform a process. A buffer tank is installed in the functional water supply pipe and the concentration of the functional water is measured in a circulation line connected with the buffer tank. When the measured concentration of the functional water goes out of a set concentration range, the functional water is returned to the functional water generator through functional water returning pipe.
Description
technical field [0001] The present invention relates to an apparatus and method for manufacturing a substrate, and more particularly, to a system and method for supplying functional water to a substrate cleaning apparatus. Background technique [0002] During the various process steps in the manufacture of integrated circuits using semiconductor substrates, impurities such as residual chemicals, small particles, contaminants, etc. are generated. In order to remove these impurities, a process step of cleaning the semiconductor substrate is required. In particular, in the manufacture of highly integrated circuits, it is very important to remove fine contaminants attached to the surface of a semiconductor substrate. [0003] In recent years, a method of cleaning a substrate using functional water (for example, hydrogen water, oxygen water, or ozone water) has been used. FIG. 1 is a view schematically showing a commonly used functional water supply system. Referring to FIG. 1...
Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More Application Information
Patent Timeline
Login to View More IPC IPC(8): F17D1/08F17D3/01F17D3/12
CPCH01L21/67051
Inventor 金柱元安斗根崔光一郑平淳崔勇男裵正龙
Owner SEMES CO LTD