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Two-dimensional scanning precision laser exposure system

A two-dimensional scanning and exposure system technology, which is applied in the direction of microlithography exposure equipment, photolithography exposure device, etc., can solve the problems of poor precision, engraving error, low production efficiency, etc., achieve easy operation and reduce engraving error , Easy installation and adjustment

Inactive Publication Date: 2006-10-25
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
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AI Technical Summary

Problems solved by technology

[0003] The technical problem of the present invention is: in order to overcome the engraving error problems caused by the intermediate links such as low production efficiency and poor precision caused by the use of perforated belts in the engraving process of the code disc, a kind of precision laser stepping table and swinging table is provided. 2D Scanning Precision Laser Exposure System with Scanning Mirror System

Method used

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  • Two-dimensional scanning precision laser exposure system
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  • Two-dimensional scanning precision laser exposure system

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Embodiment Construction

[0016] like figure 1 , 2 As shown, the embodiment of the present invention consists of a circular engraving machine table 1, a code disc to be engraved 2, a laser 3, a mask 4, a swing scanning system 5, a precision laser stepping table 6, a mask lifting mechanism 7 and a computer control system 8 components, the laser 3 is used as the light source, the beam is shaped and projected onto the scanning system 5, the computer control system 8 completes the two-dimensional scanning illumination mask 4 by controlling the movement of the swing scanning system 5 and the precision laser stepping stage 6, and the mask 4 The photolithography of a region is completed on the pattern replication on the engraved code disc 2, the circular engraving machine table 1 is driven by the engraved code disc 2 to rotate to select the area to be photo-etched, and the mask lifting mechanism 7 will mask the area when the code disc rotates. Die 4 lifts up and falls down during exposure.

[0017] The lase...

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PUM

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Abstract

A two-dimensional scan two-dimensional scan precision laser exposure system consists of circular dividing machine workbench, divided coded disk, laser, mask, oscillatory scanning system, precision laser stepping platform, mask uplift mechanism and computer control system, wherein said laser as light source, computer control system controlling oscillatory scanning system and precision laser stepping platform movement to complete two-dimensional scan illumination mask, circular dividing machine workbench driving coded disk rotating to select photo etching area, mask uplift mechanism lifting mask when coded disk rotating and downfall in exposure. The present invention has advantages of accurately positioning, easy and simple to handle, convenient installing and adjusting, greatly raising coded disk dividing precision.

Description

technical field [0001] The invention relates to a two-dimensional scanning precision laser exposure system, in particular to a two-dimensional scanning precision laser exposure system with a precision laser stepping stage and a swing scanning mirror system. technical background [0002] When engraving the code disc, the traditional process is to use a mercury lamp or a flash lamp to illuminate the mask, and use the movement of the perforated belt to make the slit transparent or opaque, so as to achieve the purpose of photosensitive or non-photosensitive adhesive layer. Different code discs can be engraved by using different perforated tapes and masks. Since the code paths of various code discs are different, different perforated belts need to be made, and it takes a long time to make a kind of perforated belt, even several days to make it. Using this process to engrave code discs is not only low in production efficiency, but also as an intermediate link in the engraving pro...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
Inventor 赵立新王肇志胡松唐小萍严伟邢薇
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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