Method for grinding GaN substrate

A grinding method and substrate technology, which is applied in the direction of grinding devices, grinding machine tools, grinding tools, etc., can solve the problems of GaN substrate scratches and achieve the effect of suppressing scratches
CN1906739AActive Publication Date: 2007-01-31SUMITOMO ELECTRIC IND LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
SUMITOMO ELECTRIC IND LTD
Publication Date
2007-01-31

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Abstract

In a polishing method of a GaN substrate according to this invention, first, while supplying a polishing solution 27 containing abrasives 23 and a lubricant 25, onto a platen 101, the GaN substrate is polished using the platen 101 and the polishing solution 27 (first polishing step). Then the GaN substrate is polished using the platen 101 in which abrasives 29 are buried, while supplying a lubricant 31 onto the platen 101 in which the abrasives 29 are buried (second polishing step).
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Description

technical field

[0001] The invention relates to a grinding method of a GaN substrate. Background technique

[0002] As a polishing method of a magnetic head slider, for example, a method disclosed in Patent Document 1 is known. In addition, as a polishing liquid for polishing a magnetic head slider, for example, a lapping oil composition for lapping described in Patent Document 2 is known.

[0003] On the other hand, as a method for polishing a GaN substrate (gallium nitride substrate) other than a magnetic head slider, for example, a method described in Non-Patent Document 1 is known. In this method, the GaN substrate is polished with a diamond paste having a particle size of 0.1 μm and a buckskin-like pad, and then the GaN substrate is chemically polished with a mixture of KOH and NaOH.

[0004] In addition, as another polishing method of a GaN substrate, for example, a method described in Patent Document 3 is known. In this method, a GaN substrate is ground with free a...

Claims

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